CMP精准过程控制系统数据库的设计  

Design of CMP Precision Process Control Database

作　　者：白琨 贾若雨 李嘉浪 岳爽 BAI Kun;JIA Ruoyu;LI Jialang;YUE Shuang(Beijing Semicore Microelectronics Equipment Co.,Ltd.,Beijing 100176,China)

机构地区：[1]北京烁科精微电子装备有限公司,北京100176

出　　处：《电子工业专用设备》2020年第3期18-22,共5页Equipment for Electronic Products Manufacturing

摘　　要：CMP设备通过精准过程控制系统(Precision Process Control,PPC)可以精准计算抛光时间。而在这一过程中,需要存储大量的抛光历史数据、晶圆厚度量测数据、计算中间值和模型配置信息等。这些数据信息数量巨大、关系复杂,并且在计算过程中需要快速获取相关数据。为了更好地适应了PPC的需求,可利用MySQL数据库对这些数据进行存储管理。通过需求分析和实体关系模型的建立,实现了数据库的设计。最终利用数据库实现了数据的有效管理及快速查询,并在机台稳定运行。CMP equipment can realize precisely control of polish time through Precision Process Control(PPC).In order to calculate polish time,PPC needs to store a large amount of data such as history polish data,wafer thickness,calculation value and recipe configuration.These data are numerous and have complex relation.And in the calculation process,PPC needs to obtain data quickly.Using database can store and manage these data.The design of database is realized by requirement analysis and ER model.As a result,effective data management and fast query are achieved by using database,and stably running in CMP equipment.

关 键 词：化学机械抛光 精准过程控制 数据库 

分 类 号：TN305.2[电子电信—物理电子学]