切应力对脑血管内皮细胞Notch通路表达的影响  

Effect of shear stress on the expression of Notch signaling pathway in brain microvascular endothelial cells

作　　者：古冬金 苏小康 王帅 郑贤美 李黎明 GU Dongjin;SU Xiaokang;WANG Shuai;ZHENG Xianmei;LI Liming(College of Life and Health Sciences,Northeastern University,Shenyang 110819,China)

机构地区：[1]东北大学生命科学与健康学院生物技术研究所,沈阳110819

出　　处：《山西医科大学学报》2020年第6期541-545,共5页Journal of Shanxi Medical University

基　　金：东北大学第十三批大学生创新训练计划项目(191195);中央高校基本科研业务费资助项目(N152004001,N172004007);国家自然科学基金资助项目(81471213)。

摘　　要：目的探讨不同切应力作用强度和作用时间对脑血管内皮细胞Notch信号通路蛋白表达的影响。方法体外培养小鼠脑微血管内皮细胞(brain microvascular endothelial cells,MECs),运用平行平板流动腔系统给MECs加载不同层流切应力(5,10,15 dyn/cm^2),在作用3,6,12 h后,采用Western blot检测Notch通路相关蛋白VEGF、Notch1、Dll4和Hes1的表达水平。结果 Western blot结果显示,切应力作用MECs 6 h和12 h后,切应力作用强度为15 dyn/cm^2时Notch1、VEGF、Dll4和Hes1蛋白的表达水平明显高于切应力为0,5,10 dyn/cm^2时的蛋白表达水平(P<0.05)。结论随着切应力作用强度和作用时间的增加,脑血管内皮细胞Notch通路相关蛋白表达量增加,表明长时间的高切应力作用更容易激活Notch通路。Objective To investigate the effects of laminar shear stress on the expression of Notch signaling pathway in cerebral vascular endothelial cells.Methods Brain microvascular endothelial cells(MECs)were exposed to laminar shear stress(5,10,15 dyn/cm^2)using a parallel-plate flow system for 3,6,12 h,respectively.Protein levels of VEGF,Notch1,Dll4 and Hes1 in MECs were detected by Western blot.Results Western blot results displayed that after being cultured under shear stress for 6 h and 12 h,the expression levels of VEGF,Notch1,Dll4 and Hes1 in 15 dyn/cm^2 group were significantly higher than those in 0 dyn/cm^2,5 dyn/cm^2 and 10 dyn/cm^2 groups(P<0.05).Conclusion With the increase of shear stress strength and time,the expression of Notch signaling pathway-related proteins is increased,suggesting that Notch signaling pathway can be activated by the long time of higher shear stress.

关 键 词：脑动静脉畸形 NOTCH信号通路 脑血管内皮细胞 切应力 

分 类 号：R363.1[医药卫生—病理学]