高能喷丸镁合金表面磁控溅射铝膜的微观结构和耐腐蚀性能  

Microstructure and Corrosion Resistance of Magnetron Sputtering Aluminum Film on Magnesium Alloy Surface Treated by High Energy Shot Peening

作　　者：张聪惠[1] 刘颖[1] 赵旭[1] 曾祥康 王婧 ZHANG Conghui;LIU Ying;ZHAO Xu;ZENG Xiangkang;WANG Jing(College of Metallurgy Engineering,Xi'an University of Architecture and Technology,Xi'an 710055,China)

机构地区：[1]西安建筑科技大学冶金工程学院,西安710055

出　　处：《机械工程材料》2020年第5期72-76,81,共6页Materials For Mechanical Engineering

基　　金：教育部科技攻关重点项目(211178);榆林市科学与科技局项目(2014cxy-05)。

摘　　要：对AZ91D镁合金基体表面进行不同时间(0,20,30,40min)高能喷丸(HESP)处理,再采用磁控溅射技术在HESP基体表面沉积铝膜,研究了铝膜的微观形貌与耐腐蚀性能。结果表明:HESP基体表面铝膜的表面组织均匀、致密,铝膜较厚,且随着HESP处理时间的延长,组织更加细小、均匀,铝膜厚度增大;经40min HESP处理后,铝膜与基体之间存在明显的过渡层,二者的结合力为16N,是未经HESP处理的3.2倍;与未经HESP处理的相比,HESP基体表面铝膜在NaCl溶液中的自腐蚀电流密度与在盐雾中腐蚀24h后形成的腐蚀坑深度均较小,且随着HESP处理时间的延长,自腐蚀电流密度与腐蚀坑深度均减小,铝膜的耐电化学和耐盐雾腐蚀性能显著提高。AZ91 Dmagnesium alloy substrate surface was treated by high energy shot peening(HESP)for different times(0,20,30,40 min),and then aluminium film was plated on the HESP substrate surface by magnetron sputtering technique.The microstructure and corrosion resistance of the aluminium film were studied.The results show that the surface structure of the aluminium film on the HESP substrate surface was uniform and dense,and the film was relatively thick;with increasing HESP time,the structure was finer and more uniform,and the film was thicker.After HESP for 40 min,there was a significant transition layer between aluminium film and substrate,and the bonding force was 16 N,which was 3.2 times that without HESP.Compared with those without HESP,the free corrosion current density of the aluminium film on the HESP substrate surface in NaCl solution and the etch pit depth formed in salt spray for 24 hwere relatively small.With increasing HESP time,the free corrosion current density and the etch pit depth both decreased,indicating that the electrochemical and salt spray corrosion resistance of the aluminium film were significantly improved.

关 键 词：镁合金 高能喷丸 磁控溅射 耐腐蚀性能 

分 类 号：TG178[金属学及工艺—金属表面处理]