基于光学光刻技术的PDMS微纳敏感结构薄膜加工工艺研究  

Formationof Micro/Nano-Structure on Polydimethylsiloxane Coating for Flexible Pressure Sensors:A Methodological Study

作　　者：章城 赵天晨 廖宁波[1] Zhang Cheng;Zhao Tianchen;Liao Ningbo(Wenzhou University,Zhejiang key Laboratory of Laser Processing Robot,Wenzhou 325035,China;Nanjing University of Aeronautics and Astronautics,College of Mechanical and Electrical Engineering,Nanjing 210016,China;Key Laboratory of Air-Driven Equipment Technology of Zhejiang Province,Quzhou University,Quzhou 324000,China)

机构地区：[1]温州大学浙江省激光加工机器人重点实验室,温州325035 [2]南京航空航天大学机电学院,南京210016 [3]浙江省空气动力装备技术重点实验室,衢州学院,衢州324000

出　　处：《真空科学与技术学报》2020年第6期560-563,共4页Chinese Journal of Vacuum Science and Technology

基　　金：浙江省自然科学基金项目(LQ20E050023);浙江省自然科学基金项目(LQ20E050004)温州市基础性工业科技项目(G20190014);国家自然科学基金项目(51202164)。

摘　　要：利用光学光刻技术进行多种形状规格聚二甲基硅氧烷(PDMS)微纳敏感结构的并行加工。研究了基于光学光刻技术的PDMS微纳敏感结构薄膜加工工艺,并加工出不同形状、、不同大小的PDMS微纳敏感结构。此外,对加工后的PDMS微纳敏感结构薄膜进行表征,观察了不同形状、不同大小的PDMS微纳敏感结构的形貌特征。结果表明:基于光学光刻技术的PDMS微纳敏感结构薄膜加工工艺具有加工效率高,加工过程中不需要刻蚀、激光加工等复杂工艺和昂贵设备的特点,并且实现了大批量PDMS微纳敏感结构的并行加工。同时,掩模板上的微纳图案较好地转移到PDMS薄膜上,具有较好的图案曝光成像和图形转移效果。此外,制备的PDMS微纳敏感结构形状较规则、排列整齐,并且不同形状,不同大小的PDMS微纳敏感结构都具有高度一致性较好,侧面轮廓分明,侧壁角接近90°的特征。A novel technique was developed to directly form the micro/nano-structured polydimethylsiloxane(PDMS)coating,a state-of-the-art pressure-sensor material.A variety of the micro/nano-structures,fabricated by lithography on PDMS coatings deposited on Si-wafer,were characterized with scanning electron microscopy.The preliminary results show that the novel technique is capable of fabricating the well-defined micro/nano-patterns,including the circle,ellipse,square and rectangle pillar-arrays with uniform-height,good consistency,clear and steep(~90°)sidewall profile.When it comes to fabrication of different-sized PDMS micro/nano-patterns on industrial scale,the newly-developed technique outperforms the conventional method with Si-based mold because of lower production cost,higher efficiency,easier operation and better environmental friendliness,and because of no investment for complicated equipment in chemical etching and laser machining of Si-based mold.

关 键 词：光学光刻 微纳结构 聚二甲基硅氧烷 结构薄膜 纳米技术 

分 类 号：TB742[一般工业技术—材料科学与工程] TB79[一般工业技术—真空技术]