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作 者:崔云先[1] 薛生俊 杜鹏 殷俊伟[1] 丁万昱 Cui Yunxian;Xue Shengjun;Du Peng;Yin Junwei;Ding Wanyu(College of Mechanical Engineering,Dalian Jiaotong University,Dalian 116028,China)
出 处:《仪器仪表学报》2020年第4期32-40,共9页Chinese Journal of Scientific Instrument
基 金:国家自然科学基金(51575074,51772038,51905071);辽宁省博士科研启动基金计划(2019-BS-043)项目资助。
摘 要:随着纳米薄膜沉积技术的发展,基于薄膜热电偶的瞬态温度测量技术在多种场合得到广泛应用。为实现薄膜热电偶在铣削加工中的应用,提出了一种高性能薄膜热电偶的制备方法。通过直流脉冲磁控溅射技术在石英基底上制备了NiCr/NiSi薄膜热电偶,并于氩气气氛进行不同温度的退火,研究了退火对薄膜热电偶综合性能的影响。结果表明,500℃退火的功能薄膜均匀性、导电性均有显著的提高,薄膜热电偶的塞贝克系数由退火前的36.3μV/℃增大到最大值40.5μV/℃,在连续热冲击和高温保持6 h后测温性能仍保持良好。将高性能薄膜热电偶研究成果用于测温铣刀的研制,并用于TC4正交铣削,得到了TC4铣削温度预测公式,为旋转类刀具加工温度的测量提供了一种可行性方案。With the development of nanofilm deposition technology, the transient temperature measurement based on thin film thermocouple has been widely applied in various applications. To realize the application of thin film thermocouple in milling, a method for preparing high performance thin film thermocouple is proposed. NiCr/NiSi thin film thermocouple is prepared on a quartz substrate by DC pulse magnetron sputtering technology. It is annealed at different temperatures in an argon atmosphere. The influences of annealing on the comprehensive property of the thin film thermocouple are studied. Experimental results show that uniformity and conductivity of functional films annealed at 500℃ are improved significantly. The Seebeck coefficient of thin film thermocouple is increased from 36.3 μV/℃ before annealing to the maximum value of 40.5 μV/℃. The performance of temperature measurement remains stable after continuous thermal shock and high temperature insulation for 6 hours. The research result of high-performance thin film thermocouple is used in the development of temperature measurement milling cutter and TC4 orthogonal milling. The prediction formula of TC4 milling temperature is obtained. The proposed method provides a feasible solution for the temperature measurement of of rotary processing.
分 类 号:TH811[机械工程—仪器科学与技术]
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