金属Y掺杂Mo-N薄膜的机械性能和摩擦学性质研究  

Mechanical and tribological properties of Y-doped Mo-N films

作　　者：栾书多 张佳鑫 顾广瑞[1] LUAN Shuduo;ZHANG Jiaxin;GU Guangrui(College of Science,Yanbian University,Yanji 133002,China)

机构地区：[1]延边大学理学院,吉林延吉133002

出　　处：《延边大学学报（自然科学版）》2020年第2期122-128,共7页Journal of Yanbian University（Natural Science Edition）

基　　金：国家自然科学基金资助项目(51272224)。

摘　　要：利用射频磁控和直流磁控共溅射的方法制备了金属Y掺杂的Mo-N薄膜.对制备的薄膜样品进行元素组成、微观结构、表面形貌、摩擦学性质分析显示:薄膜的择优取向由未掺杂时的γ-Mo2N (111)改变为Y掺杂后的γ-Mo2N (200).与未掺杂的Mo-N薄膜相比较,所制备的MoYN薄膜的硬度明显降低,但耐磨性和平均摩擦系数均有所改善.其中Y掺杂含量为9.44at%时,薄膜的耐磨性为最佳,平均摩擦系数为最小(0.283),硬度为(24.13±3.15) GPa.A series of Y-doped Mo-N films were prepared by RF magnetron and D C magnetron co-sputtering. The element composition, microstructure, surface morphology, tribological properties of the film samples show that the preferred orientation of Mo-N film without doping is γ-Mo2N(111) and the preferred orientation of MoYN film after doping is changed to γ-Mo2N(200). Compared with the undoped Mo-N films, the hardness of the prepared MoYN films is decreased, while the wear resistance and average friction coefficient are increased. When the Y doping content is 9.44 at%, the wear resistance is the best, the average friction coefficient is 0.283, and the hardness is(24.13±3.15) GPa.

关 键 词：磁控共溅射 Mo-N薄膜 摩擦学性能 

分 类 号：O484.4[理学—固体物理]