等离子抛光石英玻璃特性研究  

Study on Characteristics of Plasma Polished Quartz Glass

作　　者：郑才国 陈庆川[1] 聂军伟[1] 李民久 陈美艳 ZHENG Cai-guo;CHEN Qing-chuan;NIE Jun-wei;LI Min-jiu;CHEN Mei-yan(Southwestern Institute of Physics,Chengdu 610041,China;The Engineering and Technical College of Chengdu University of Technology,Leshan 614007,China)

机构地区：[1]核工业西南物理研究院,四川成都610041 [2]成都理工大学工程技术学院,四川乐山614007

出　　处：《真空》2020年第4期72-76,共5页Vacuum

基　　金：国家自然科学基金(11475059);乐山市重点科技计划项目(19GZD039);成都理工大学工程技术学院院级基金项目(C122017029)。

摘　　要：离子束具有加工精度高、可控性好、加工面洁净无污染等优点,利用其加工超光滑光学元件可避免传统机械加工方法所带来的亚表面损伤。本文将射频等离子体应用于石英玻璃的加工,对射频等离子体抛光效应进行了研究。分析通过改变离子束的能量、束流和入射角等工艺参数,对抛光效果的影响。试验结果表明,表面粗糙度RMS随着离子束能量的增大先降低后升高,离子束抛光能量为600eV时,粗糙度到达最小,为1.73RMS/nm,离子束束流为200mA时,粗糙度到达最小为1.26RMS/nm。表面粗糙度随抛光时间增加先降低后升高。Ion beam has the advantages of high machining accuracy,good controllability,clean and pollution-free processing surface,etc.Using ion beam to fabricate ultra-smooth optical elements can avoid the subsurface damage caused by traditional machining methods.In this paper,RF plasma was applied for processing of quartz glass,and the polishing effect of RF plasma was studied.The influence of process parameters such as ion beam energy,beam density and angle of incidence on the polishing effect was analyzed.The test results show that the surface roughness RMS first decreased and then increased with the increase of ion beam energy.When the ion beam polishing energy was 600 eV,the roughness reached the minimum of 1.73 RMS/nm,and when the ion beam beam was 200 mA,the roughness reached the minimum of 1.26 RMS/nm.As the polishing time increases,the surface roughness decreases and then increases.

关 键 词：离子束抛光 入射角 射频离子源 表面粗糙度 

分 类 号：TP391[自动化与计算机技术—计算机应用技术]