磁控溅射法制备Al2O3复合高铝玻璃薄膜  

Al2O3 and High Alumina Glass Composite Films by Magnetron Sputtering

作　　者：万法琦 贺建雄 鲍思思 姜宏 文峰[1,2] 马艳平 WAN Faqi;HE Jianxiong;BAO Sisi;JIANG Hong;WEN Feng;MA Yanping(State Key Laboratory of South China Sea Resources Utilization&Key Laboratory of Special Glass,Haikou 570228,China;School of Materials Science and Engineering,Hainan University,Haikou 570228,China;AVIC Hainan Special Glass Science and Technology Co.Ltd.&State Key Laboratory of Special Glass in Hainan Province,Chengmai 571924,China)

机构地区：[1]海南海资源利用国家重点实验室&海南省特种玻璃重点实验室,海南海口570228 [2]海南大学材料科学与工程学院,海南海口570228 [3]海南中航特玻科技有限公司&特种玻璃国家重点实验室,海南澄迈579124

出　　处：《材料科学与工程学报》2020年第4期619-624,共6页Journal of Materials Science and Engineering

基　　金：海南省重大科技计划资助项目(ZDKJ2017011);国家自然科学基金资助项目(51761010);海南大学科研平台建设资助项目(ZY2019HN09)。

摘　　要：采用磁控溅射法,创新性地以高铝玻璃和Al2O3为靶材,制备了Al2O3复合高铝玻璃薄膜。利用多种技术手段对薄膜的表面形貌、结构及成分进行分析和表征。结果表明,在Al2O3靶功率为120 W,其他条件不变的情况下,所制备的薄膜综合性能最优。此外,对薄膜的硬度及可见光透过率进行了测试,测试结果表明薄膜的纳米硬度可达18 GPa以上,同时保持了高于85%的良好可见光透过率。Al2O3 and high-alumina glass composite film was creatively grown on glass via a magnetron sputtering process with both high-alumina glass and Al2O3 as target materials.The morphology,structure and composition of the thin composite films were characterized by a variety of characterization techniques.The results show that the comprehensive performance of the thin film is optimal under the condition that the sputter power of Al2O3 target is 120 W.In addition,the hardness and the transmittance in the visible light range were tested and the results show that the nano-hardness of the films is up to 18 GPa,while the transmittance is more than 85%.

关 键 词：高铝玻璃 磁控溅射 氧化铝 

分 类 号：TB34[一般工业技术—材料科学与工程]