FTO薄膜表面激光诱导制备ZnO纳米结构  

Laser-induced preparation of ZnO nanostructures on FTO thin films

作　　者：李双双[1,2] 王轶伦 李保家 LI Shuangshuang;WANG Yilun;LI Baojia(Changzhou Vocational Institute of Engineering,Changzhou 213164,China)

机构地区：[1]常州工程职业技术学院,江苏常州213164 [2]江苏大学机械工程学院,江苏镇江212013 [3]江苏大学材料科学与工程学院,江苏镇江212013

出　　处：《电镀与涂饰》2020年第15期1010-1015,共6页Electroplating & Finishing

基　　金：常州工程职业技术学院科研基金项目(11130300118025)。

摘　　要：采用磁控溅射法在FTO(掺氟二氧化锡)玻璃基底表面沉积金属Zn层,再将其置于双氧水溶液中,通过纳秒脉冲激光对其表面进行辐照处理来实现ZnO纳米结构的制备。研究了激光能量密度和扫描速率对ZnO纳米结构的形成和得到的ZnO纳米结构复合FTO(ZnO/FTO)薄膜表面形貌和光电性能的影响。结果表明,当Zn层厚度为200 nm时,可保证FTO薄膜表面既出现完整的ZnO纳米结构,又仅有少量Zn剩余。当激光能量密度为0.80 J/cm2,扫描速率为15 mm/s时,FTO薄膜表面制备出了均匀一致性最好的ZnO纳米结构,此时ZnO/FTO薄膜有最佳的光电性能,其在400~800 nm波段的平均透光率为70.18%,平均反射率为7.10%,方块电阻为9.23Ω。A metallic Zn layer was deposited on the surface of FTO(fluorine-doped tin oxide)glass substrate by magnetron sputtering.The Zn-coated FTO glass was put into a H2O2 solution,and then subjected to nanosecond pulsed laser irradiation to prepare ZnO nanostructures.The effects of laser fluence and scanning speed on the formation of ZnO nanostructures,as well as the surface morphology and photoelectric properties of the nanostructured ZnO-coated FTO(ZnO/FTO)films were studied.The results showed that when the thickness of the Zn layer was 200 nm,there were complete ZnO nanostructures and only a small amount of Zn remained on the surface of the FTO film.The ZnO nanostructures with the best uniformity were prepared on the surface of FTO film at a laser fluence of 0.8 J/cm2 and a scanning speed of 15 mm/s.The obtained ZnO/FTO film exhibited superior photoelectric properties,with an average transmittance of 70.18%and an average reflectance of 7.10%in the waveband from 400 nm to 800 nm,and a sheet resistance of 9.23Ω.

关 键 词：掺氟二氧化锡薄膜 锌 磁控溅射 双氧水 激光辐照 氧化锌纳米结构 透光率 反射率 

分 类 号：TB43[一般工业技术]