具有全方位光管理能力的光阱结构  

Light trapping structure with omni-directional light management capability

作　　者：张文杰 王军 王艳周 吴宗豪 李亚丽[1] ZHANG Wen-Jie;WANG Jun;WANG Yan-Zhou;WU Zong-Hao;LI Ya-Li(School of Physical Science and Technology,Lanzhou University,Lanzhou 730000,China)

机构地区：[1]兰州大学物理科学与技术学院,兰州730000

出　　处：《原子与分子物理学报》2020年第4期632-636,共5页Journal of Atomic and Molecular Physics

摘　　要：本文提出了一种基于砷化镓(GaAs)材料且具有全方位光管理能力的纳米方形光阱结构.通过光学模拟可知,该结构在较大结构参数范围内具有优异的全向光管理能力.当该结构的有效厚度为407 nm时,在AM1.5G光照下,其光电流密度可达29.51 mA/cm 2,而在同样条件下,2000 nm厚的平面GaAs结构只能产生19.80 mA/cm 2的光电流密度.由光电模拟可知,为了获得合理的高光电转换效率,应使少数载流子寿命大于等于1.0×10-7 s,表面复合速率小于等于100 s/cm.This paper proposes a nano square structure with omni-directional light management capability based on gallium arsenide(GaAs)materials.From optical simulation,it can be found that the structure has excellent omni-directional light management ability within a large range of structural parameters.When the effective thickness of the structure is 407 nm,its photocurrent density can reach 29.51 mA/cm 2 under AM 1.5G illumination.while under the same conditions,the planar GaAs structure with a thickness of 2000 nm can only produce the photocurrent density of 19.80 mA/cm 2.It can be known from photoelectric simulation that in order to obtain a reasonably high photoelectric conversion efficiency,the minority carrier lifetime should be greater than or equal to 1.0×10-7 s,and the surface recombination rate should be less than or equal to 100 s/cm.

关 键 词：光管理 全方位陷光结构 时域有限差分法 光电器件 

分 类 号：O472+.8[理学—半导体物理]