W波段分布作用速调管的研制  

Design of a W-band extended interaction klystron

作　　者：韦莹[1] 杨继涛[1] 周军[1] 李冬凤[1] 欧阳佳佳[1] 窦钺[1] Wei Ying;Yang Jitao;Zhou Jun;Li Dongfeng;Ouyang Jiajia;Dou Yu(Beijing Vacuum Electronics Research Institute,Beijing 100015,China)

机构地区：[1]北京真空电子技术研究所,北京100015

出　　处：《强激光与粒子束》2020年第10期44-48,共5页High Power Laser and Particle Beams

基　　金：国家重大科学仪器设备开发专项(2013YQ200503)。

摘　　要：简要介绍了一种W波段分布作用速调管的设计思路、设计方案和模拟结果,并给出了该管的测试结果。该管采用大压缩比圆柱电子枪和永磁聚焦系统,阴极电压17 kV,阴极电流0.78 A;高频系统由5间隙和11间隙(输出腔)的分布作用腔组成,采用长短槽梯形结构。样管实现了脉冲输出功率大于2 kW、带宽500 MHz、增益40 dB、工作比5%等指标。This paper briefly introduces the design of a W-band extended interaction klystron(EIK),and gives the test results.The high frequency extended interaction circuit consisted of five 5-gap buncher cavities and one 11-gap output cavity which can obtain wider bandwidth.This ladder-type multi-gap cavity circuit is easy to fabricate and supports greater energy margins.Theπ-mode is selected as the operating mode of the 5-gap(or 11-gap)cavities.By now,with an electron beam of 17 kV and 0.78 A,the EIK has achieved a peak output power of 2 kW,bandwidth of500 MHz,gain of 40 dB,and duty cycle of 5%.

关 键 词：微波功率器件 分布作用速调管 W波段 电子光学系统 

分 类 号：TN122.7[电子电信—物理电子学]