磁控溅射法制备ZnO及ZnO/ZnMgO异质结薄膜及其光学性能研究  

Optical Properties of ZnO and ZnO/ZnMgO Heterojunction Films Prepared by Magnetron Sputtering

作　　者：张变莲[1,2] 成桢[1,2] 孟瑜 Zhang Bianlian;Cheng Zhen;Meng Yu(ShaanxiKey Laboratory of Surface Engineering and Remanufacturing,Xi’an University,Xi’an 710065;School of Mechanical&Material Engineering,Xi’an University,Xi’an,Shaanxi 710065,P.R.China)

机构地区：[1]陕西省表面工程与再制造重点实验室西安文理学院,西安710065 [2]机械与材料工程学院西安文理学院,西安710065

出　　处：《现代科学仪器》2020年第5期34-38,45,共6页Modern Scientific Instruments

基　　金：国家自然科学基金(614013561603324);陕西省自然科学基金(2017JM6040);西安市科技计划项目(2019KJWL23,2019KJWL24);西安文理学院科研团队:智能感知与控制(XAWLKYTD019);先进表面工程与装备延寿(XAWLKYTD013)。

摘　　要：采用磁控溅射仪,分别在硅和玻璃衬底上,制备纯ZnO薄膜及掺Mg浓度分别为0.05%、0.25%、0.5%、1.0%的ZnO/ZnMgO异质结薄膜。采用SEM、XRD和光谱仪对薄膜样品的表面形貌、微观结构、透反射率及拉曼特性进行表征。研究结果表明:(1)相比于玻璃衬底,ZnO薄膜更易于在硅衬底衬底上生长,在硅衬底上生长的薄膜更加致密均匀,结晶度更好;(2)相比于掺杂的ZnO/ZnMgO异质结薄膜,单层的纯ZnO薄膜具有良好的致密性和平整的生长状态;(3)掺杂Mg会使薄膜表面变粗糙,对光的反射率降低,反射率的波动周期变短;(4)薄膜的拉曼光谱峰值不仅受到衬底材料的影响,同时还受掺杂浓度的影响。Pure ZnO films and ZnO/ZnMgO heterojunction films with Mg doped concentration of 0.05%,0.25%,0.5%and 1%were grown on silicon and glass substrates by magnetron sputtering.The surface morphology and microstructure of ZnO/ZnMgO films were measured by SEM,XRD and reflection.The results of optical properties test show that(1)compared with the glass substrate,ZnO film is easier to grow on the silicon substrate,and the film grown on the silicon substrate will be more compact and uniform,and the crystallinity will be better;(2)compared with the doped ZnO/ZnMgO heterojunction film,the single-layer pure ZnO film has excellent compactness and flat growth state;(3)doping mg will make the film surface The results show that the reflectivity of the film decreases with the increase of roughness,and the fluctuation period of reflectivity becomes shorter.(4)the Raman peak of the film is not only affected by the substrate material,but also by the doping concentration.

关 键 词：磁控溅射 ZNO薄膜 ZnMgO/ZnO异质结薄膜 表面形貌 光学性能 

分 类 号：TN3[电子电信—物理电子学]