电子束蒸发工艺对MgF2薄膜光学性能的调制与分析  

Modulation and Analysis of Optical Properties of MgF2 Thin Films by Electron Beam Evaporation Process

作　　者：宋冠宇 涂洁磊 孙晓宇[1] 徐晓壮 颜平远 邓臣 李亚楠 SONG Guanyu;TU Jielei;SUN Xiaoyu;XU Xiaozhuang;YAN Pingyuan;DENG Chen;LI Yanan(School of Energy and Environmental Science,Yurmnan Normal University,Kunming.650500,CHN;Yunnan Provincial Key Laboratory of Rural Energy Engineering,Kunming,650500,CHN)

机构地区：[1]云南师范大学能源与环境科学学院,昆明650500 [2]云南省农村能源工程重点实验室,昆明650500

出　　处：《固体电子学研究与进展》2020年第5期366-371,共6页Research & Progress of SSE

基　　金：国家自然科学基金资助项目(61664010)。

摘　　要：电子束蒸发技术中,电子束流和衬底温度将显著影响薄膜生长过程及其性能。研究了核心工艺参数电子束流和衬底温度对MgF2薄膜光学性能的影响与规律,结果显示提高电子束流和衬底温度均可导致其折射率和色散率的增大、反射率的降低。改变上述工艺参数均可实现对其折射率、色散率及反射率的调制。由于衬底温度对色散率的影响较为显著,因此改变衬底温度对其折射率的调制更加有效。MgF2薄膜折射率变化对多层膜的反射率有较强影响,调节沉积MgF2时的工艺参数有助于降低多层减反射膜的平均反射率。In the electron beam evaporation technology,the electron beam current and substrate temperature will significantly affect the growth process and performance of the thin film.The influence and law of the core process parameters electron beam current and substrate temperature on the optical properties of MgF2 thin films were studied.The results show that increasing the electron beam current and substrate temperature can lead to an increase in refractive index and dispersive power of MgF2 films,and a decrease in its reflectivity;changing the above process parameters can achieve modulation of its refractive index,dispersive power,and reflectivity.Because the substrate temperature has a significant effect on the dispersive power,it is more effective to modify the refractive index of the film by changing the substrate temperature.The refractive index change of MgF2 film has a strong influence on the reflectivity of multilayer coating.By adjusting the process parameters when depositing MgF2,the average reflectivity of the multilayer antireflection coating can be reduced.

关 键 词：MgF2薄膜 电子束流 衬底温度 折射率 色散率 反射率 

分 类 号：O484.4[理学—固体物理]