温度对中频磁控溅射沉积金属锆膜的影响  

Effect of Temperature on Metal Zirconium/Zirconium Nitride Film Deposited by Medium Frequency Magnetron Sputtering

作　　者：高毅[1] 李兰[1] 刘际伟[1] 徐金江[1] GAO Yi;LI Lan;LIU Jiwei;XU Jinjiang(Institute Of Chemical Materials,CAEP,Mianyang 621999,China)

机构地区：[1]中国工程物理研究院化工材料研究所,四川绵阳621999

出　　处：《兵器装备工程学报》2020年第10期166-169,共4页Journal of Ordnance Equipment Engineering

摘　　要：为了解决复杂环境下玻璃不耐腐蚀,致密性不理想的问题,以直流脉冲离子源辅助中频磁控溅射沉积在玻璃表面制备了纯锆镀层和氮化锆镀层,研究了沉积温度对其微观形貌、粗糙度、纳米压痕硬度的影响。结果表明:随沉积温度升高,锆膜/氮化锆膜中晶粒尺寸增大,膜层硬度下降;同时氮化锆晶粒间隙会随沉积温度升高而变小,膜层致密性随之提高。In order to improve the corrosion-resistance and compactness of glass under complex environment,pure zirconium film and zirconium nitride film were deposited on glass by DC pulse ion source assisted medium frequency magnetron sputtering deposition method,respectively.Their microstructure,surface roughness and nanoindentation hardness were studied as a function of deposition temperature.The results showed that the grain size of the zirconium/zirconium nitride film increase with the increasing of deposition temperature,while the hardness of the film decrease.Meanwhile,the grain gaps of zirconium nitride decreased and the density of film were enhanced.

关 键 词：中频磁控溅射 锆膜 氮化锆 

分 类 号：TB383.2[一般工业技术—材料科学与工程]