Fe3O4磁性导体表面磁控溅射NdCoCr薄膜组织和磁性分析  

Synthesis and Magnetic Properties of Magnetron Sputtered NdCoCr Thin Film on Fe3O4 Substrate

作　　者：程智君[1] 袁勋[1] 何超 Cheng Zhijun;Yuan Xun;He Chao(Department of Eilectronic Engineering,Shangrao Polytechnic,Shangrao 334109,China;Ma An Shan Heng’an Electrical Engineering Co.,LTD.,Maanshan 243002,China)

机构地区：[1]上饶职业技术学院电子工程系,上饶334109 [2]马鞍山恒安电气工程有限公司,马鞍山243002

出　　处：《真空科学与技术学报》2020年第11期1017-1021,共5页Chinese Journal of Vacuum Science and Technology

基　　金：江西省教育厅科学技术研究项目(GJJ181448);江西省高等学校教学改革研究项目(JXJG-16-77-2)。

摘　　要：采用磁控溅射工艺,以Fe3O4磁性导体作为基底材料在其表面制得Nd Co Cr合金薄膜,分析了加入不同比例Co的情况下制得的Nd-Co非晶薄膜垂直磁各向异性(PMA)性能及其磁畴特征,同时对退火态薄膜组织相成分和磁性进行研究。结果表明:本实验制得了具有非晶形态的薄膜结构,当薄膜内的Co含量增加后,形成了强度更高的Fe3O4衍射峰。当Co含量逐渐增大后,Ms发生了不断增强。初始薄膜Keff表现为随Co含量增大而提高。Co含量为4%试样MFM图像上形成了明暗相间条纹。通过MFM方法测试得到的Δ■r曲线表现为与Ku曲线形状具有明显相似性,都在Co含量为6%位置处达到最大值。各退火态试样中都形成了Nd4Co3、Nd2Co17、Nd Co Cr2。当薄膜内析出NdCoCr5与Nd2Co7纳米晶后,获得了更大矫顽力,当Co含量大于4%时,退火态薄膜形成了较低的矫顽力。The NdCoCr film was deposited by magnetron co-sputtering on Fe3O4 substrate.The influence of the Co-content on the perpendicular magnetic anisotropy(PMA)and magnetic domain characteristics of Nd-Co films was investigated with X-ray diffraction,scanning electron microscopy and magnetic force microscopy(MFM).The preliminary results show that the Co-content had a major impact.Specifically,as the Co-content increased in amorphous NdCoCr film,the saturation magnetization(Ms)increased,and the effective magnetic anisotropy Keff increased,especially at the initial growth stage.As shown in MFM images,the light and dark stripes appeared on the coating surfaces,being fairly pronounced at 0.6%(wt).Nd4Co3,Nd2Co17 and NdCoCr2 phases formed in annealing at 600℃for 30 m;and with the increase of Co-content,the coercivity of annealed a-NdCoCr first rapidly decreased and then slowly increased,minimizing at 0.4%,possibly because of the formation and precipitation of NdCoCr5 and Nd2Co7 nano-grains.

关 键 词：磁控溅射 金属合金 NdCoCr薄膜 磁性 

分 类 号：TM271[一般工业技术—材料科学与工程]