基于Comsol的矩形磁控溅射靶磁场模拟与分析  

Simulation and Analysis of Magnetic Field of Rectangular Magnetron Sputtering Target by Comsol

作　　者：王雪[1] 程磊 徐锋[1] 贾昆鹏 左敦稳[1] WANG Xue;CHENG Lei;XU Feng;JIA Kunpeng;ZUO Dunwen(College of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China)

机构地区：[1]南京航空航天大学机电学院,江苏南京210016

出　　处：《机械制造与自动化》2021年第1期96-98,106,共4页Machine Building & Automation

基　　金：国家自然科学基金项目(51575269);江苏省六大人才高峰资助计划项目(ZBZZ-005)。

摘　　要：磁控溅射靶表面磁场分布与靶材刻蚀特性、薄膜沉积均匀性密切相关。为确定合适的磁控靶结构参数以改善靶材表面水平磁场分布均匀性,采用Comsol软件建立矩形平面磁控溅射靶三维模型,对靶材表面磁场分布进行模拟与分析,研究永磁体结构尺寸和磁轭尺寸对磁场分布的作用规律,得到靶材表面水平磁场分布均匀、水平磁感应强度范围合理的溅射靶结构参数。研究结果可提高磁控溅射靶磁场模拟准确性,对溅射靶结构参数的选择具有指导作用。The distribution of magnetic field on the surface of magnetron sputtering target is closely related to the etch morphology of target and the uniformity of thin film deposition.In order to find reasonable structural parameters to improve the uniformity of the distribution of horizontal magnetic field,the three-dimensional of rectangular plane magnetron sputtering target were established by Comsol software.The effect of permanent magnet structure size and magnetic yoke size on the distribution of magnetic field was studied,and the sputtering target structure parameters with uniform horizontal magnetic field distribution and reasonable horizontal magnetic induction intensity range were obtained.The research improves the accuracy of magnetic field simulation of target and plays a guiding role in the selection of structural parameters of magnetron sputtering target.

关 键 词：磁控溅射 Comsol 结构参数 磁场分布 

分 类 号：TB43[一般工业技术]