光掩膜版用低羟基高纯石英玻璃的研究  

Study on Low Hydroxyl and High Purity Quartz Glass for Photomask

作　　者：陈娅丽 吴椿烽 钱宜刚 汤明明 陈京京 顾铃铃 缪丽华 CHEN Yali;WU Chunfeng;QIAN Yigang;TANG Mingming;CHEN Jingjing;GU Lingling;MIAO Lihua(Zhongtian Technology Advanced Material Co.,Ltd.,Nantong 226009,China)

机构地区：[1]中天科技精密材料有限公司,南通226009

出　　处：《玻璃》2021年第3期6-10,共5页Glass

摘　　要：介绍了采用不同原材料由一步法工艺所制备的石英玻璃的方法及其光学性能与杂质含量,基于羟基含量高、尺寸小等缺点,通过优化工艺,以两步法(沉积、脱羟烧结)制备的石英玻璃更具有优良的性能。检测结果表明,两步法气相沉积工艺制备的石英玻璃具有更低的羟基含量≤1×10^(-6),以及良好的透过率85%以上,完全满足高端光电技术领域的应用需求。The method of preparing quartz glass with different raw materials by one-step process was introduced.It also displayed optical properties and impurity content in this paper.Based on the shortcomings of high hydroxyl content and small size,the quartz glass prepared by two-step process has better performance,which process includes deposition and dehydroxylation sintering.The results show that the quartz glass prepared by two-step vapor deposition process has lower hydroxyl content than 1×10^(-6) and good transmittance of more than 85%,which fully meets the application requirements of photoelectric technology in high level fields.

关 键 词：气相沉积工艺 CVD法 等离子沉积工艺 羟基 石英玻璃 

分 类 号：TQ171[化学工程—玻璃工业]