铝、硅元素添加对TiN基薄膜组织和性能的影响  

Effect of Addition of Aluminum and Silicon Elements on Microstructure and Properties of TiN-based Film

作　　者：郭力铭 段利利[1] 于晓丰 吴化[1] GUO Liming;DUAN Lili;YU Xiaofeng;WU Hua(Key Laboratory of Advanced Structural Materials Co-built by Ministry of Education,Changchun University of Technology,Changchun 130012,China)

机构地区：[1]长春工业大学,先进结构材料省部共建教育部重点实验室,长春130012

出　　处：《机械工程材料》2020年第12期37-41,共5页Materials For Mechanical Engineering

基　　金：长春市科技支撑计划项目(11K246)。

摘　　要：采用物理气相沉积(PVD)法制备TiN、Ti-Al-N和Ti-Si-N 3种薄膜,研究了铝和硅元素添加对薄膜组织和性能的影响。结果表明:Ti-Al-N薄膜组织中Ti3AlN相存在择优取向,形成了粗大的柱状晶;Ti-Si-N薄膜生成了Si_(3)N_(4)相,组织相对细小;Ti-Al-N薄膜的膜基结合力最小,Ti-Si-N薄膜的膜基结合力最大;Ti-Al-N薄膜的表面粗糙度最小,硬度和弹性模量最大;Ti-Si-N薄膜的摩擦因数略高于Ti-Al-N薄膜的,但二者相差很小,这应与Ti-Si-N薄膜组织较细小且形成的Si_(3)N_(4)相具有一定的自润滑性能有关。Three films of TiN,Ti-Al-N and Ti-Si-N were prepared by physical vapor deposition(PVD).The influence of aluminum and silicon addition on microstructure and properties of films was studied.The results show that the Ti3AIN phase existed preferred orientatian in microstructure of Ti-Al-N film,and a coarse columnar crystal microstructure formed.The Si_(3)N_(4) phase formed in Ti-Si-N film,and the microstructure of Ti-Si-N film was more fine.The film base bonding force was the smallest of Ti-Al-N film and was the largest of Ti-Si-N film.The Ti-Al-N film had the smallest surface roughness and the largest hardness and elastic modulus.The friction factor of Ti-Si-N film was slightly higher than that of Ti-Al-N film,but the difference between them was small,which should be related to the fact that the microstructure of Ti-Si-N film was fine,and Si_(3)N_(4) phase formed by Ti-Si-N film had a certain self-lubricating property.

关 键 词：物理气相沉积 表面粗糙度 膜基结合力 摩擦因数 择优取向 

分 类 号：TG174.444[金属学及工艺—金属表面处理]