减反射膜仿真优化与制备  

Simulation optimization and preparation of anti-reflective coatings

作　　者：李攀 朱良秋 卢宏 LI Pan;ZHU Liangqiu;LU Hong(Wuhan National Laboratory of Optoelectronics,Huazhong University of Science and Technology,Wuhan 430074,China)

机构地区：[1]华中科技大学武汉光电国家研究中心,湖北武汉430074

出　　处：《光学技术》2021年第1期28-30,共3页Optical Technique

摘　　要：利用有限时域差分方法设计并优化了由二氧化硅和氮化硅组成的双层和三层减反射膜,在1550nm波长附近实现减反射效果。采用等离子增强化学气相沉积高质量的二氧化硅和氮化硅薄膜,制备了氧化硅、氮化硅双层减反射膜,同时制备了氮化硅、氧化硅、氮化硅三层减反射膜。测量了两种减反射膜的减反射效果,双层减反射膜的反射率可以达到0.18%以下,三层减反射膜比双层减反射膜具有更大的带宽。The two-layer and three-layer antireflection coatings composed of silica and silicon nitride were designed and optimized by finite-difference time-domain(FDTD)method.High quality silicon dioxide and silicon nitride films were deposited by plasma enhanced chemical vapor deposition(PECVD)to prepare silicon oxide and silicon nitride double-layer antireflection coatings.At the same time,three layers of antireflection films,including silicon nitride,silicon oxide and silicon nitride,were prepared.The antireflection effects of two kinds of antireflection coatings were measured.The results show that the reflectivity of double-layer antireflection coatings is less than 0.18%,and the three-layer antireflection coating has larger bandwidth.

关 键 词：薄膜光学 减反射膜 有限时域差分 等离子增强化学气相沉积 

分 类 号：TN26[电子电信—物理电子学]