高温溅射Sn-Ni复合薄膜材料及其电化学性能研究  

Electrochemical Properties of Sn-Ni Composite Filmsby Sputtering at High Temperature

作　　者：王春花 赵杰 刘娜 卫巍 董彦杰 白国梁 WANG Chunhua;ZHAO Jie;LIU Na;WEI Wei;DONG Yanjie;BAI Guoliang(College of Chemistry and Chemical Engineering,Anqing Normal University,Anqing 246011,China)

机构地区：[1]安庆师范大学化学化工学院,安徽安庆246011

出　　处：《鲁东大学学报（自然科学版）》2021年第2期162-167,共6页Journal of Ludong University:Natural Science Edition

基　　金：安徽省自然科学基金项目(1908085QB61);安徽省高校自然科学研究重点项目(KJ2019A0546);安徽省“六卓越、一拔尖”卓越人才培养创新项目(2019zyrc075)。

摘　　要：Sn基负极材料由于具有高的比容量而受到研究者们的青睐。本文采用磁控溅射法制备了Sn-Ni复合薄膜材料,并研究了溅射温度对Sn-Ni复合薄膜材料的物理及电化学性能的影响。采用X射线衍射(XRD)和扫描电子显微镜(SEM)、EDS等手段对材料进行了物理表征,并采用恒流充放电性能测试、循环伏安测试(CV)等手段研究了溅射温度对Sn-Ni复合薄膜材料电化学性能的影响。研究表明,当溅射温度为100℃时,Sn-Ni复合薄膜材料的首周放电比容量为734 mAh·g^(-1),充电比容量为591 mAh·g^(-1)。充放电循环100圈后容量保持率为54%,而纯锡的容量保持率仅为28%。此外,Sn-Ni复合薄膜材料还具有优异的倍率性能。Due to the high specific capacity,the Sn-based anode materials have attracted very much attention.In this paper,Sn-Ni composite thin films were prepared by magnetron sputtering method,and the influence of sputtering temperature on the physical and electrochemical properties of Sn-Ni composite thin films was studied.The materials were characterized by X-ray diffraction(XRD),scanning electron microscopy(SEM)and EDS,and the influence of sputtering temperature on the electrochemical performance of Sn-Ni composite films was studied by means of the constant current charge-discharge performance test and cyclic voltammetry test(CV).The results show that the initial specific discharge-charging capacity of Sn-Ni composite film are 734 mAh·g^(-1) and 591 mAh·g^(-1) at the sputtering temperature of 100℃.And the capacity retention rate of Sn-Ni composite film is 54%.However,the capacity retention rate of pure tin is only 28%after 100 cycles.In addition,Sn-Ni composite films also have excellent rate performance.

关 键 词：磁控溅射 负极材料 温度条件 Sn-Ni复合薄膜 

分 类 号：G0643.36[文化科学]