图案化In_(2)O_(3):Sn薄膜制备及显影剂对图案制备的影响研究  

Preparation of patterned In_(2)O_(3):Sn films and the effect of developer on the patterns

作　　者：任洋 贺海燕[2] 赵高扬 王允威[2,3] REN Yang;HE Haiyan;ZHAO Gaoyang;WANG Yunwei(Advanced Materials Analysis and Test Center, Xian University of Technology, Xi'an 710048, China;School of Materials Science and Engineering, Xian University of Technology, Xian 710048, China;School of Biological and Chemical Engineering, Panzhihua University, Panzhihua 617000, China)

机构地区：[1]西安理工大学现代分析测试中心,西安710048 [2]西安理工大学材料科学与工程学院,西安710048 [3]攀枝花学院生物与化学工程学院钒钛资源综合利用四川省重点实验室,四川攀枝花617000

出　　处：《功能材料》2021年第3期3092-3097,共6页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(51802260);陕西省自然科学基础研究计划资助项目(2019JQ-321);四川省重点实验室资金资助项目(2019FTSZ05)。

摘　　要：功能薄膜的图案化是微电子加工中不可或缺的工序,目前已经成为制约我国微型化集成电路发展的关键因素。本研究以制备低成本且高质量的图案化In_(2)O_(3):Sn薄膜为目的,摒弃常规且工艺复杂的干法刻蚀或湿法刻蚀的研究思路,转而向一种化学修饰的溶胶凝胶技术探索。利用化学修饰后的纳米级溶质颗粒的紫外感光特性,以及曝光前后溶质颗粒在有机溶剂中发生的溶解度变化,通过溶胶凝胶工艺成膜,后经曝光、显影、热处理等工序,形成图案化的In_(2)O_(3):Sn薄膜。重点探索了显影剂配方对薄膜图案制备的影响规律。该方法去除了包含光刻胶制备、剥离以及刻蚀等一系列复杂工序,薄膜图案化制备简单且质量较高,是一种新的值得继续探究并广泛推广的薄膜图案化技术。The patterning of functional films is an indispensable process in microelectronics processing,and has become a key factor restricting the development of miniaturized integrated circuits in our country.The purpose of this work is to prepare patterned In_(2)O_(3):Sn thin films using a chemically modified sol-gel technique which is low-cost and high-quality,instead of the conventional(but complicated)methods,like dry etching or wet etching.Due to the ultraviolet sensitivity of the chemically modified particles,and the solubility changes of the particles in the organic solvent before and after exposure,the patterned films can be fabricated by photosensitive sol-gel process,that is dip-coating,exposure,development,heat treatment and other steps.The influence of developer on the patterned films has been investigated.This method is simple because a series of complex processes have been removed,including photoresist preparation,stripping and etching.The patterned films have a high quality.This technique is new and worthy of further exploration and wide spread promotion.

关 键 词：ITO薄膜 图案化 溶胶-凝胶法 显影剂 

分 类 号：TB332[一般工业技术—材料科学与工程]