光刻设备中冷却水系统污染控制研究  

Contamination Control Investigation of Cooling Water System in Lithography Equipment

作　　者：王明 WANG Ming(Shanghai Micro Electronics Equipment(Group)Co.,Ltd.,Shanghai 201203,China)

机构地区：[1]上海微电子装备(集团)股份有限公司,上海201203

出　　处：《集成电路应用》2021年第3期28-30,共3页Application of IC

基　　金：上海市发展和改革委员会(XA4300089-2017-604)先进封装光刻机产业化课题。

摘　　要：阐述光刻设备中冷却水系统污染控制,针对水系统运行时产生的污染物,研究其产生机理,分析其来源,定义其控制手段,为系统可靠运行提供保障。This paper describes the pollution control of the cooling water system in the lithography equipment. Aiming at the pollutants produced by the water system during operation, the generation mechanism is studied, the source is analyzed, and the control means are defined, so as to provide guarantee for the reliable operation of the system.

关 键 词：集成电路制造 水系统 机理研究 污染控制 

分 类 号：TN403[电子电信—微电子学与固体电子学] TN305.7