透明介质材料的超快激光微纳加工研究进展  

Research Advancement on Ultrafast Laser Microprocessing of Transparent Dielectrics

作　　者：李佳群 闫剑锋[1] 李欣[2] 曲良体 Li Jiaqun;Yan Jianfeng;Li Xin;Qu Liangti(Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China;School of Mechanical Engineering,Beijing Institute of Technology,Beijing,100081,China;Department of Chemistry,Tsinghwa University,Beijing 100084,China)

机构地区：[1]清华大学机械工程系,北京100084 [2]北京理工大学机械车辆学院,北京100081 [3]清华大学化学系,北京100084

出　　处：《中国激光》2021年第2期301-315,共15页Chinese Journal of Lasers

基　　金：国家重点研发计划(2017YFB1104300);国家自然科学基金(51775303,52075289)。

摘　　要：透明介质材料具有高透光性、高耐热性和良好的耐腐蚀性,被广泛应用于航空航天、微电子器件和光学元件等领域,这些应用对透明介质材料微纳加工的精度与质量提出了一定的要求。超快激光具有超高的峰值强度与超短的脉冲持续时间,可突破衍射极限并极小化热影响区,具有出色的加工精度与加工质量,为透明介质材料的微纳尺度加工提供了多样化的手段。综述了透明介质材料的超快激光微纳加工研究进展,包括超快激光加工透明介质材料的内部结构、相关机理和应用领域三个方面,并对透明介质材料的超快激光微纳加工进行了总结与展望。Significance Transparent dielectrics generally refer to materials with a transmittance of more than 80%in the visible light range,such as glass,gemstones,diamonds,some organic polymers,and various crystals.They have been extensively used in aerospace,electronic elements,flexible photonic devices,and other advanced fields because of their high transmittance and corrosion resistance.However,processing transparent dielectrics with traditional methods like mechanical physical means in the micro-nano scale is rather difficult because they can easily cause breakage and cracks.With ultrahigh intensity and ultrashort pulse duration,an ultrafast laser(pulse duration<10 ps)can break the diffraction limit due to its wide material adaptability and extreme precision and can minimize the heat-affected zone,providing an advanced approach for micro-nano fabrication.Hence,an ultrafast laser has become the most appropriate tool for the micro-nano fabrication of transparent dielectrics.The corresponding phenomena and physical mechanisms in the ultrafast laser fabrication of transparent materials must be investigated to optimize the micro-nano scale processing of transparent dielectrics and utilize it in more application fields.Progress The structural changes induced by the ultrafast laser in the irradiation area can be divided into three types according to the different pulse energy levels focused inside the transparent dielectrics:1)low pulse energy can induce the formation of areas where the refractive index change occurs inside the dielectrics,2)under moderate pulse energy,a nanograting structure can be induced,and 3)high pulse energy induces a nanovoid structure at the irradiation point.If the energy of the laser incident into transparent dielectrics slightly exceeds the modification threshold,the structural change in the irradiation area will be induced,which causes the refractive index to change from the initial n0 to n1(Fig.3).As for this structural change,there exist two mainstream explanations.Some scholars believe that th

关 键 词：激光技术 超快激光 透明介质材料 微纳加工 折射率变化 纳米光栅 纳米孔洞 

分 类 号：TN249[电子电信—物理电子学]