利用正交实验制备金刚石薄膜及其场发射的研究  

The Field Emission of Diamond Films Prepared by Orthogonal Experiment

作　　者：高金海 张洁[1] 李成刚 张兵临 崔颖琦[1] GAO Jinhai;ZHANG Jie;LI Chenggang;ZHANG Binglin;CUI Yingqi(College of Physics and Electronic Engineering,Zhengzhou.Normal University,Zhengzhou.He'nan 450044,China;Key Laboratory of Material Physics,Ministry of Education,College of Physical Engineering,Zhengzhou University,Zhengzhou He'nan 450052,China)

机构地区：[1]郑州师范学院物理与电子工程学院,河南关郑州450044 [2]郑州大学物理工程学院材料物理教育部重点实验室,河南郑州450052

出　　处：《电子器件》2021年第2期507-512,共6页Chinese Journal of Electron Devices

基　　金：教育部科学技术重点项目(205091);河南省高等学校重点科研项目(16A140039);河南省科技厅科技攻关项目(182102210140)。

摘　　要：场发射阴极金刚石薄膜的制备方法有很多,利用微波等离子化学气相沉积的方法制备薄膜,文中详细介绍了正交分解法实验制备金刚石薄膜的过程。并对薄膜进行扫描电镜、拉曼光谱、X射线实验,分析了其形貌与结构;用场发射二级结构研究薄膜的场发射性能,简单分析了金刚石薄膜的成因和场发射性能。There are many preparation methods of field emission cathode diamond film. The film is prepared by microwave plasma chemical vapor deposition. The preparation process of diamond film by orthogonal decomposition method is introduced in detail. The morphology and structure of the thin film were analyzed by Scanning electron microscope, Raman spectroscopy and X-ray experiments. The field emission properties of diamond films are studied by means of emission secondary structure. The genesis and field emission properties of diamond films are simply analyzed.

关 键 词：微波等离子体化学气相沉积 正交实验 微米金刚石薄膜 

分 类 号：TB383[一般工业技术—材料科学与工程] O484[理学—固体物理]