检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:宋言 林毅 SONG Yan;LIN Yi(Jiangxi Copper Technology Research Institute Co.,Ltd.,Nanchang 330500,China)
机构地区:[1]江西铜业技术研究院有限公司,江西南昌330500
出 处:《电镀与涂饰》2021年第7期555-559,共5页Electroplating & Finishing
摘 要:考察了电解铜箔生产中较易控制的工艺参数,如电解液温度,流速,钛板粗糙度与打磨方式,以及后处理时的温度与摆放方式,对电解铜箔的表面形貌、粗糙度、抗拉强度、断裂总延伸率、光泽等方面的影响。电解溶液温度和流速控制在合适的范围,钛阴极辊的粗糙度(Rz)控制在2μm以下,以及打磨时砂路尽量顺直,都有利于制备出符合要求的铜箔。后处理加热和令毛面朝下可以加快铜箔残余内应力的释放,降低其翘曲。The effects of several process conditions easily controlled during the production of electrolytic copper foil i.e.temperature,flow rate,roughness and polishing method of titanium plate,as well as temperature and laying way in posttreatment on the surface morphology,roughness,tensile strength,total breaking elongation,and gloss of electrolytic copper foil were studied.Controlling the temperature and flow rate of electrolyte within an appropriate range,providing the cathodic titanium roller a roughness(Rz)2μm below,and polishing the cathodic titanium roller as straightly as possible are all beneficial for preparation of favorable copper foils.Post-heating where the rough side is towards the ground helps to accelerate the release of residual stress inside the copper foil,reducing the risk of warpage.
分 类 号:TQ153.14[化学工程—电化学工业]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.7