光刻设备中光学系统的温压控制研究  

Study on Temperature and Pressure Control Investigation of Optical System in Lithography Equipment

作　　者：王明 WANG Ming(Shanghai Micro Electronics Equipment(Group)Co.,Ltd.,Shanghai 201203,China)

机构地区：[1]上海微电子装备(集团)股份有限公司,上海201203

出　　处：《集成电路应用》2021年第4期20-21,共2页Application of IC

基　　金：上海市发展和改革委员会(XA4300089-2017-604)先进封装光刻机产业化课题。

摘　　要：阐述光刻设备中光学系统的温压控制,它融合了先进温度与压力控制算法、小型流体管路冷却与稳流技术等多项先进技术,能够为系统内的光学组件提供温度精度优于±0.02℃,压力控制精度优于±3Pa的受控洁净气体,是解决光刻设备中光学系统相关性能的关键。This paper describes the temperature and pressure control of optical system in photolithography equipment. It integrates advanced temperature and pressure control algorithm, small fluid pipeline cooling and steady flow technology and other advanced technologies. It can provide controlled clean gas with temperature accuracy better than ±0.02 ℃ and pressure control accuracy better than ±3 Pa for optical components in the system. It is the key to solve the related performance of optical system in photolithography equipment.

关 键 词：集成电路制造 换热 温度控制 压力控制 

分 类 号：TN405[电子电信—微电子学与固体电子学]