电子束蒸发球面夹具系统膜厚均匀性的研究  

Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System

作　　者：潘永刚 刘政[1] 王奔 张四宝 吕辰瑞 Pan Yonggang;Liu Zheng;Wang Ben;Zhang Sibao;LüChenrui(Xi'an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences,Xi'an,Shaanxi 710119,China;Shanghai Mifeng Laser Technology Co.,Ltd.,Shanghai 200120,China)

机构地区：[1]中国科学院西安光学精密机械研究所,陕西西安710119 [2]上海米蜂激光科技有限公司,上海200120

出　　处：《激光与光电子学进展》2021年第5期323-327,共5页Laser & Optoelectronics Progress

基　　金：中国科学院自研项目(Y490771C01);“十三五”装备预研公用技术和领域基金(414xxxx0202)。

摘　　要：基于电子束蒸发小面源非余弦膜厚的分布公式,研究了电子束蒸发球面夹具系统光学薄膜厚度的分布均匀性。同时建立数学模型,通过MathCAD编程求解修正挡板的形状及摆放位置,控制光学薄膜厚度的分布均匀性。以蒸发Ta_(2)O_(5)薄膜为例,优化修正挡板的位置及形状,并制备厚度为600 nm的Ta_(2)O_(5)单层薄膜。实验结果表明,采用该模型优化设计的修正挡板,实际厚度不均匀性为0.6%,验证了该模型的可行性与正确性。Based on the noncosine film thickness distribution formula of the small area source in electron beam evaporation,the distribution uniformity of optical thin film thickness of the electron beam evaporation spherical fixture system is studied in this paper.At the same time,the mathematical model is established,the shape and position of the correction mask are corrected by MathCAD programming,so as to control the thickness distribution uniformity of the optical thin film.Set the evaporated Ta_(2)O_(5) thin films as an example,the position and shape of the correction mask are optimized,and Ta_(2)O_(5) singlelayer thin film with thickness of 600 nm is fabricated.Experimental results show that the actual thickness nonuniformity of the modified baffle optimized by the model is 0.6%,which validates the feasibility and correctness of the model.

关 键 词：薄膜 均匀性 电子束蒸发 球面夹具 修正挡板 

分 类 号：O484[理学—固体物理]