基于硅模具制作的纳米裂纹及应变传感器  

Nanocracks and Strain Sensor Fabricated by Silicon Mold

作　　者：张之昊 李浩然 张思琦 刘军山[1] Zhang Zhihao;Li Haoran;Zhang Siqi;Liu Junshan(Key Laboratory for Micro/Nano Technology and System of Liaoning Province,School of Mechanical Engineering,Dalian University of Technology,Dalian 116024,China)

机构地区：[1]大连理工大学机械工程学院辽宁省微纳米技术及系统重点实验室,辽宁大连116024

出　　处：《微纳电子技术》2021年第4期337-341,共5页Micronanoelectronic Technology

基　　金：国家重点研发计划资助项目(2020YFB2008500);国家自然科学基金资助项目(51875083);大连市科技创新基金资助项目(2020JJ25CY018)。

摘　　要：纳米裂纹制造技术作为一种非传统的纳米加工技术被应用于纳米线条、纳流控芯片和传感器等众多研究领域,然而纳米裂纹生成的随机性及其图案的不确定性限制了该项技术的发展。利用硅模具以及二次倒模工艺,在聚二甲基硅氧烷(PDMS)基底表面制作相互平行且分布均匀的金纳米裂纹。硅模具上带有利用硅各向异性腐蚀工艺加工出的V型沟槽结构,通过二次倒模工艺将该结构转移至PDMS基底表面,从而在弯曲时形成应力集中以控制裂纹的生成。进一步制作出具有较高灵敏度的应变传感器,其在应变0%~1.23%区间内满量程应变灵敏系数(GF)高达4 814,并可以多次重复使用。As an unconventional nanofabrication technique,nanocrack fabrication technique is applied in many research fields,such as nanowires,nanofluidic chips,sensors and so on.However,the development of the technique is limited by the generation randomness and pattern uncertainty of the nanocracks.The parallel and evenly distributed gold nanocracks were fabricated on the surface of the polydimethylsiloxane(PDMS)substrate by using silicon mold and double-template transferring process.V-shaped grooves were fabricated through anisotropic etching of Si on the surface of silicon mold,and then the structure was transferred to the surface of the PDMS substrate by double-template transferring process,forming stress concentration during bending to control the generation of the cracks.Furthermore,a strain sensor with higher sensitivity was fabricated.The sensor has a full range gauge factor(GF)up to 4 814 in the strain range of 0%-1.23%and can be used repeatedly.

关 键 词：应变传感器 纳米裂纹 纳米加工技术 硅各向异性腐蚀 聚二甲基硅氧烷(PDMS)二次倒模 应变灵敏系数(GF) 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置]