反应磁控溅射高熵合金薄膜的工艺与表征  

Preparation and Characterization of High Entropy Alloy Films by Reactive Magnetron Sputtering

作　　者：房晓彤 上官晓峰[1] 邵文婷 徐大鹏[1] 杨巍[1] FANG Xiaotong;SHANGGUAN Xiaofeng;SHAO Wenting;XU Dapeng;YANG Wei(School of Materials Science and Chemical Engineering,Xi’an Technological University,Xi’an 710021,China)

机构地区：[1]西安工业大学材料与化工学院,西安710021

出　　处：《西安工业大学学报》2021年第3期323-331,共9页Journal of Xi’an Technological University

基　　金：陕西省重点研发计划项目(2021GY-208)。

摘　　要：为探究在Si(100)上反应磁控溅射制备高熵合金氮化物薄膜的工艺,文中对靶材以及薄膜的微观结构、成分、杨氏模量、硬度等进行了表征,在以AlSiTiVCrNb合金为靶材的真空腔室中通入N 2进行反应磁控溅射,制备(AlSiTiVCrNb)N高熵合金薄膜,并与传统硬质薄膜进行对比分析。利用SEM/EDS确定薄膜形貌结构,厚度及表面元素分布,利用XRD对薄膜进行相结构分析,采用纳米压痕测试高熵合金氮化物薄膜的表面硬度及杨氏模量。试验结果表明:高熵合金氮化物薄膜元素含量主要受靶材与溅射产额影响,随着溅射温度,靶功率,负偏压及反应气体通入量的改变薄膜力学性能变化显著;靶材与薄膜均为NaCl型FCC结构,但随工艺参数变化,薄膜的衍射峰出现移动,且出现非晶倾向;薄膜与基底间结合力普遍较高,硬度和杨氏模量随工艺变改化而变,硬度最高可达到37.24 GPa。因而在镀膜过程中通入N 2,通过调控工艺参数,可在Si基底表面生成具有较高硬度和结合能力良好的高熵合金氮化物薄膜,为高熵合金及其氮化物薄膜在刀具等多领域中的一系列应用提供试验支持。The study is intended to explore the technology for preparing high entropy alloy nitride films by reactive magnetron sputtering on Si(100).The microstructure,composition,Young’s modulus and hardness of the target and the films were characterized.High entropy alloy films of(AlSiTiVCrNb)N were prepared by reactive magnetron sputtering in a vacuum chamber with N 2 with AlSiTiVCrNb alloy as the target material.They were compared with traditional hard films.SEM/EDS were used to analyze their structure,thickness and the surface element distribution.XRD was employed to study their phase structure.Nano indentation was used to test their surface hardness and Young’s modulus.The experiment results show that the content of the elements in nitride films is mainly affected by the target material and sputtering yield and that the mechanical properties of the films change greatly with sputtering temperature,target power,negative bias and reaction gas flow.The target and films both have NaCl type FCC structure.But the diffraction peak moves and tends to be amorphous with the change of process parameters.The adhesion between the film and the substrate is generally high.The hardness and Young’s modulus vary with the preparation technology,and the maximum hardness is up to 37.24 GPa.The results show that(AlSiTiVCrNb)N films with high hardness and adhesion can be formed on the surface of Si substrate by N 2 during the coating process.This study provides a scientific experimental foundation for a series of applications of high entropy alloy nitride films in cutting tools and other fields.

关 键 词：磁控溅射 高熵合金薄膜 靶材 纳米压痕 微观结构 力学性能 

分 类 号：TG174.453[金属学及工艺—金属表面处理]