基板颗粒快速检测技术的研究  

作　　者：蓝科 刘逍 李润芝 

机构地区：[1]上海微电子装备(集团)股份有限公司,上海201203

出　　处：《科技创新与应用》2021年第18期8-11,15,共5页Technology Innovation and Application

摘　　要：为了检测光刻机掩模板或玻璃基板表面的杂质颗粒,结合米氏散射理论与暗场检测原理,通过杂质颗粒在固定空间角的散射光能量来标定颗粒的数目与尺寸。以激光整形光路形成均匀性良好的线型激光对样品表面进行照明,在非反射方向使用线阵CCD相机进行散射光的收集。基于图像算法对采集的颗粒散射图像进行单颗粒灰度和统计,结合统计学规律实现颗粒尺寸与相机灰度和的关系标定,从而实现突破相机像素分辨限制的快速颗粒检测。In order to detect impurity particles on the surface of lithography mask or glass substrate,based on Michaelis scattering theory and dark field detection principle,the number and size of impurity particles are calibrated by the scattered light energy of impurity particles at a fixed space angle.The sample surface is illuminated by a linear laser with good uniformity formed by the laser shaping optical path,and the scattered light is collected by a linear array CCD camera in the non-reflection direction.Based on the image algorithm,the grayscale and statistics of the collected particle scattering image are carried out,and the relationship between the particle size and the gray sum of the camera is calibrated combined with the statistical law,so as to achieve the fast particle detection ability to break through the limitation of camera pixel resolution.

关 键 词：颗粒检测技术 暗场检测 米氏散射 掩模板 激光整形 

分 类 号：TQ171.7[化学工程—玻璃工业]