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作 者:王卫芳[1] 陆宝山[1] 关集俱 WANG Weifang;LU Baoshan;GUAN Jiju(Suzhou Vocational Institute of Industrial Technology,Suzhou Jiangsu 215104,China)
出 处:《机床与液压》2021年第14期55-59,共5页Machine Tool & Hydraulics
基 金:国家自然科学基金青年基金项目(51805345);江苏省自然科学基金青年基金项目(BK20170373);苏州市重点实验室资助项目(SZS201815)。
摘 要:为考察氧化铝陶瓷的精密抛光性能,将氧化铝陶瓷试片置于陶瓷工作环与研磨盘间进行研磨试验。用120目砂纸初磨试样,使试片原始表面粗糙度为1.49μm;使用碳化硅研磨液抛光,抛光过程中改变研磨液的浓度、粒径、载质量、转速及时间,并观察不同参数下氧化铝陶瓷试片的抛光效果。试验结果表明:采用粒径2μm的碳化硅磨粒,在轴向载质量为9 kg、磨盘转速为90 r/min、研磨液浓度为35%的工艺条件下连续研磨50 min,可使氧化铝陶瓷的表面粗糙度从初始的1.49μm迅速下降至0.22μm,表面质量改善率达到85%。在SEM电子显微镜及3D表面轮廓仪下观察,其试片表面由原先凹凸不平的粗糙表面变成平坦如镜的光滑表面,验证了氧化铝陶瓷材料良好的精密抛光加工性能。To investigate the precision polishing properties of alumina ceramics,the alumina ceramic test pieces were placed between ceramic working ring and grinding disc for grinding test.The original surface roughness of the test piece was 1.49μm by using the 120 abrasive paper;the silicon carbide polishing liquid was used to polish,the polishing liquid concentration,particle size,load,speed and time were changed in the polishing process and the polishing effect of the alumina ceramic test piece under different parameters was observed.The experimental results show that the surface roughness of the alumina ceramics decreases rapidly from original 1.49μm to 0.22μm and the surface quality improvement rate reaches 85%when the abrasive particle size of silicon carbide is 2μm,the axial load is 9 kg,the grinding speed is 90 r/min,the polishing liquid concentration is 35%and the continuous grinding time is 50 min.SEM electron microscope and 3 D surface profilometer were used for observation,and the test pieces changed from original uneven rough surface to smooth surface as flat as mirror,which verified the good precision polishing performance of alumina ceramic materials.
分 类 号:TG580.6[金属学及工艺—金属切削加工及机床] TQ174.6[化学工程—陶瓷工业]
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