SU8 etch mask for patterning PDMS and its application to flexible fluidic microactuators  

作　　者：Benjamin Gorissen Chris Van Hoof Dominiek Reynaerts Michael De Volder 

机构地区：[1]Department of Mechanical Engineering,Katholieke Universiteit Leuven&Flanders Make,Celestijnenlaan 300B,3001 Leuven,Belgium [2]Imec,Kapeldreef 75,3001 Leuven,Belgium [3]Institute for Manufacturing,Department of Engineering,University of Cambridge,17 Charles Babbage Road,Cambridge,CB30FS,UK

出　　处：《Microsystems & Nanoengineering》2016年第1期101-105,共5页微系统与纳米工程（英文）

基　　金：BG is a Doctoral Fellow of the Research Foundation—Flanders(F.W.O.),Belgium.MDV acknowledges support from the ERC starting grant HIENA(no.337739).

摘　　要：Over the past few decades,polydimethylsiloxane(PDMS)has become the material of choice for a variety of microsystem applications,including microfluidics,imprint lithography,and soft microrobotics.For most of these applications,PDMS is processed by replication molding;however,new applications would greatly benefit from the ability to pattern PDMS films using lithography and etching.Metal hardmasks,in conjunction with reactive ion etching(RIE),have been reported as a method for patterning PDMS;however,this approach suffers from a high surface roughness because of metal redeposition and limited etch thickness due to poor etch selectivity.We found that a combination of LOR and SU8 photoresists enables the patterning of thick PDMS layers by RIE without redeposition problems.We demonstrate the ability to etch 1.5-μm pillars in PDMS with a selectivity of 3.4.Furthermore,we use this process to lithographically process flexible fluidic microactuators without any manual transfer or cutting step.The actuator achieves a bidirectional rotation of 50°at a pressure of 200 kPa.This process provides a unique opportunity to scale down these actuators as well as other PDMS-based devices.

关 键 词：PDMS lithography SU8 etch mask MICROACTUATOR bending actuator fluidic actuator 

分 类 号：TN3[电子电信—物理电子学]