离子束溅射沉积设备制备薄膜均匀性研究  

Research of Uniformity of Thin Films Prepared by Ion Beam Sputtering Deposition Equipment

作　　者：陈国钦 袁祖浩 胡凡 范江华 CHEN Guoqin;YUAN Zuhao;HU Fan;FAN Jianghua(The 48^(th)Research Institute of CETC,Changsha 410111,China)

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2021年第4期35-39,共5页Equipment for Electronic Products Manufacturing

摘　　要：针对离子束溅射沉积设备薄膜均匀性问题,采用理论分析计算和试验相结合的方法计算了薄膜厚度的分布差异,由此设计出修正板外形。实验结果表明,修正后的薄膜均匀性从32%提高到了1.7%。Aiming at the problem of film uniformity of ion beam sputtering deposition equipment,and the distribution difference of film thickness is calculated by combining theoretical analysis and experiment,then the shape of the correction plate is designed.The experimental results show that the film uniformity is improved from 32%to 1.7%.

关 键 词：离子束溅射沉积 薄膜 修正板 均匀性 

分 类 号：TN305[电子电信—物理电子学]