外部磁场对电-磁场协同增强HiPIMS放电及V膜沉积与性能的调制  

Modulation of external magnetic field on(E-MF)HiPIMS discharge,deposition,and properties of vanadium films

作　　者：李春伟[1,2] 田修波[2] 姜雪松[1] 陈春晟[1] LI Chunwei;TIAN Xiubo;JIANG Xuesong;CHEN Chunsheng(College of Engineering and Technology,Northeast Forestry University,Harbin 150040,China;State Key Laboratory of Advanced Welding and Joining(Harbin Institute of Technology),Harbin 150001,China)

机构地区：[1]东北林业大学工程技术学院,哈尔滨150040 [2]先进焊接与连接国家重点实验室(哈尔滨工业大学),哈尔滨150001

出　　处：《哈尔滨工业大学学报》2021年第8期144-152,共9页Journal of Harbin Institute of Technology

基　　金：中央高校基本科研业务费专项(2572018BL09);黑龙江省自然科学基金(LH2019E001)。

摘　　要：为了获得新型HiPIMS稳定放电及制备优质膜层时的最优外部磁场参数,研究外部磁场变化对电-磁场协同增强高功率脉冲磁控溅射((E-MF)HiPIMS)放电及沉积特性的调制过程。在其他工艺参数保持不变的情况下,研究了外部磁场(线圈电流)对HiPIMS钒(V)靶放电规律以及V膜微观结构和性能的影响。采用数字示波器监测HiPIMS放电行为,利用XRD、SEM、AFM、摩擦磨损试验机及电化学腐蚀法等表面分析方法,研究V膜相结构、表面形貌、截面形貌、耐摩擦磨损性能及耐腐蚀性能等沉积特性。结果表明:随线圈电流的增加,基体离子电流密度逐渐增加,当线圈电流为6 A时基体离子电流密度最高可达209.2 mA/cm^(2)。V膜的相结构仅为V(111)但其晶面衍射峰强度随线圈电流的增加而逐渐增加。V膜表面呈现出典型的圆凹坑状形貌特征,其表面粗糙度先减小后增大且最小仅为10 nm。当线圈电流(<4 A)较低时V膜生长表现为致密细小的晶体生长结构,膜层沉积速率随着线圈电流的增加而增加。当线圈电流为4 A时,V膜样品的摩擦系数最小、耐磨性最优,同时V膜样品具有最好的耐蚀性。The optimal external magnetic field parameters for stable discharge of a novel HiPIMS and obtaining high-quality film were explored,and the modulation of the external magnetic field on the discharge and deposition characteristics of electro-magnetic fields synergistically enhancing high power impulse magnetron sputtering((E-MF)HiPIMS)was studied.The effects of coil current of external magnetic field on the discharge of HiPIMS vanadium target as well as the microstructure and properties of vanadium films were investigated.The discharge behavior of HiPIMS was monitored,and the influences of external magnetic field on the phase structure,surface morphology,cross-section morphology,friction and wear resistance,and corrosion resistance of vanadium films were studied by XRD,SEM,AFM,friction and wear tester,and electrochemical corrosion method.Results show that with the increase of the coil current,the substrate ion current increased gradually.When the coil current was 6 A,the maximum substrate ion current density reached 209.2 mA/cm^(2).The phase structure of vanadium film was only V(111),but the intensity of its diffraction peak increased with the increase of coil current.The surface of vanadium film exhibited typical round-pit shape.The surface roughness decreased first and then increased,and the minimum was only 10 nm.At low coil current(<4 A),the vanadium film showed a compact and fine crystal growth structure.With the increase of coil current,the deposition rate of the film increased gradually.When the coil current was 4 A,the friction coefficient of the vanadium film was the smallest,the wear resistance was the best,and the vanadium film samples had the best corrosion resistance.

关 键 词：高功率脉冲磁控溅射 线圈电流 基体离子电流密度 钒膜 沉积速率 

分 类 号：TG174.444[金属学及工艺—金属表面处理]