改善硬盘磁头气垫面边缘残留物的研究  

Research for Improving Residue of ABS Edge in HDD Head

作　　者：金则清 JIN Ze-Qing(SAE Technologies Development(Dongguan)Co.,Ltd.,Dongguan Gangdong523087,China)

机构地区：[1]东莞新科技术研究开发有限公司,广东东莞523087

出　　处：《机电产品开发与创新》2021年第4期42-43,共2页Development & Innovation of Machinery & Electrical Products

摘　　要：本文针对公司电脑硬盘部件磁头的ABS面(气垫面)制造过程中,等离子刻蚀及清洗工艺完成后在ABS面图形边缘发现残留物(小突起,Fencing)的问题,进行了试验分析研究并找到了解决问题的办法。在对淀积物残留物形成机理的研究基础上结合对光刻技术、等离子刻蚀技术的研究的后,采用DOE实验方法优化了软烘及显影工艺后,增强了光刻胶与基材的粘附性进从而极大地减少了残留物的产生。ABS面图形边缘残留物的问题得到有效解决。In this thesis,researched and found a solution for solving the problem of residue formed in the process of making the company's HDD head ABS surface(Air Bearing Surface),the residue(small protrusion,or called fencing)can be observed at ABS edge after plasma etching and cleaning process completion.Based on the study of the mechanism of residue formation combined with the study of photolithography technology and plasma etching technology,the soft baking and development process was optimized by DOE experimental method,which greatly reduced the residue by enhancing the adhesion of photo resist and substrate.The problem of ABS surface graphical edge residue was effectively solved.

关 键 词：ABS面 残留物 等离子刻蚀 正性光刻胶 

分 类 号：TP30[自动化与计算机技术—计算机系统结构]