Self-aligned fiber-based dual-beam source for STED nanolithography  

作　　者：Jian Chen Guoliang Chen Qiwen Zhan 陈建;陈国梁;詹其文(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 201800,China)

机构地区：[1]School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 201800,China

出　　处：《Chinese Optics Letters》2021年第7期82-86,共5页中国光学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China (No.61805142);the Shanghai Science and Technology Committee (No.19060502500);the Natural Science Foundation of Shanghai (No.20ZR1437600)。

摘　　要：A fiber-based source that can be exploited in a stimulated emission depletion(STED) inspired nanolithography setup is presented.Such a source maintains the excitation beam pulse, generates a ring-shaped depletion beam, and automatically realizes dual-beam coaxial alignment that is critical for two beam nanolithography.The mode conversion of the depletion beam is realized by using a customized vortex fiber, which converts the Gaussian beam into a donut-shaped azimuthally polarized beam.The pulse width and repetition frequency of the excitation beam remain unchanged, and its polarization states can be controlled.According to the simulated point spread function of each beam in the focal region, the full width at half-maximum of the effective spot size in STED nanofabrication could decrease to less than 28.6 nm.

关 键 词：NANOLITHOGRAPHY vortex fiber direct laser writing STED controlled fabrication 

分 类 号：TN249[电子电信—物理电子学]