基于结构光3D成像技术的945nm窄带滤光片研制  

Development of a 945-nm Narrowband Filter Based on a Structured Light 3D Imaging Technology

作　　者：魏博洋 刘冬梅[1] 付秀华[1] 张静[1] 李爽 周斌 Wei Boyang;Liu Dongmei;Fu Xiuhua;Zhang Jing;Li Shuang;Zhou Bin(College of Photoelectric Engineering,Changchun University of Science and Technology,Changchun,Jilin 130022,China;Optorun(Shanghai)Co.,Ltd.,Shanghai 200444,China)

机构地区：[1]长春理工大学光电工程学院,吉林长春130022 [2]光驰科技(上海)有限公司,上海200444

出　　处：《激光与光电子学进展》2021年第14期490-498,共9页Laser & Optoelectronics Progress

基　　金：吉林省重大科技攻关专项(20190302095GX)。

摘　　要：随着5G时代的到来,结构光3D成像技术对不可见光接收模组窄带滤光片的要求不断提高。基于法布里-珀罗全介质型干涉仪膜系设计理论,选择Si-H和SiO2分别作为高、低折射率材料,采用光谱拆分法,使用电感耦合磁控溅射技术和直流磁控溅射技术交替成膜,以提高膜层的聚集密度,降低膜层的粗糙度;并通过辅助阳极降低成膜温度对通带光谱的影响。最终制备的滤光片以945 nm为中心波长,对926~952 nm光的平均透过率达到98.5%,0°~38°通带偏移量为13 nm。With the advent of the 5 Gera,the requirement of structured light 3 Dimaging technology for the narrowband filter of the invisible light receiving module is significantly increasing.Based on the film design theory of the Fabuli-Boro full-medium type interferometer,Si-H and SiO2 are selected as the high and low refractive index materials.Using the spectral resolution method,the inductively coupled magnetron sputtering technology and DC magnetron sputtering technology are used to alternately form the film to improve its aggregation density.The film’s roughness is reduced.Besides,the film-forming temperature influence on the passband spectrum is reduced by the auxiliary anode.The final preparation takes a central wavelength of 945 nm.The average transmittance between 926 nm and 952 nm reaches 98.5%,and the offset of 0°-38°passband is 13 nm.

关 键 词：薄膜 3D结构光 窄带滤光片 拆分法 磁控溅射 聚集密度 辅助阳极 

分 类 号：O436[机械工程—光学工程]