上颌第一磨牙与第二前磨牙牙根间微种植体支抗用于上颌磨牙远移的CBCT研究  

A CBCT study on micro-implant anchorage implanted in the space between the maxillary first molar and second premolar for distalization of upper molar

作　　者：陈红[1] 马萱怡 刘承灵 刘倩 CHEN Hong;MA Xuanyi;LIU Chengling;LIU Qian(Department of Orthodontics,Gansu Provincial Hospital,China,Lanzhou 730000;State Key Laboratory of Military,Xi'an;State Key Laboratory of Military Stomatology&National Clinical Research Center for Oral Diseases&Shaanxi Clinical Research Center for Oral Diseases,Department of Orthodontics,School of Stomatology,the Fourth Military Medical University,China)

机构地区：[1]甘肃省人民医院口腔正畸科,兰州730000 [2]第四军医大学基础医学院二大队 [3]军事口腔医学国家重点实验室,口腔疾病国家临床医学研究中心,陕西省口腔疾病临床医学研究中心,第四军医大学口腔医院正畸科

出　　处：《实用口腔医学杂志》2021年第5期666-670,共5页Journal of Practical Stomatology

摘　　要：目的:评估微种植体支抗(MIA)以不同位点、角度植入上颌第一磨牙(M1)与第二前磨牙(P2)牙根之间用于磨牙远移时,其稳定性和可行性。方法:筛选30例CBCT资料,预设MIA尖端直径1.2 mm,植入骨内长度6 mm。植入高度为釉牙骨质界CEJ以上4 mm和6 mm,角度与P2长轴呈20°、40°和60°,记录将MIA植入后尖端所在平面P2根外侧壁至皮质骨外侧壁的距离CRD、M1-P2牙根间距离RRD以及植入位点皮质骨厚度ICD。所得数据采用SPSS 25.0软件分析。结果:将MIA与P2长轴呈40°、60°植入时,不能保证磨牙远移绝对可行。将MIA与P2长轴呈40°,距离CEJ 6 mm植入时更有利于磨牙远移,该位点ICD更有利于MIA稳定。结论:上颌磨牙远移时,建议将MIA植入上颌M1-P2牙根之间,距离CEJ 6 mm,与P2长轴呈40°。Objective:To study the micro-implant anchorage(MIA)implanted in the space between the maxillary first molar(M1)and second premolar(P2)for distalization of upper molar by CBCT.Methods:The CBCT images of 30 cases underwent MIA treatment were included and analyzed,the preset apex diameter of MIA was 1.2 mm and the actual length in the alveolar bone was 6 mm.When MIA was implanted at 20°,40°and 60°to the long axis of the P2 respectively,4 mm and 6 mm above the cemento-enamel junction(CEJ)at the same time,the measuring plane was marked where the top of MIA was,then the distance between cortical bone surface and root of P2(CRD),interradicular space between M1 and P2(RRD),the thickness of the cortical bone(ICD)were measured.SPSS 25.0 was used for statistical analysis.Results:When MIA was implanted at 40°and 60°to the long axis of the P2,molar distalization was not absolutely safe.It was more beneficial to molar distalization when MIA was implanted at 40°to the long axis of the P2,6 mm above the CEJ,and cortical bone thickness at this point was also more helpful in the stability of the MIA.Conclusion:For upper molar distalization MIA is recommended to be implanted in the space between maxillary first molar and second premolar,at 40°to the long axis of the P2,6 mm above the CEJ.

关 键 词：CBCT 微种植体支抗 磨牙远移 釉牙骨质界 

分 类 号：R783.5[医药卫生—口腔医学]