磁控溅射电流对刀具表面Al/Cr-DLC膜组织和力学性能的影响  

Effect of Magnetron Sputtering Current on the Microstructure and Mechanical Properties of Al/Cr-DLC Films on Tool Surface

作　　者：冯金广[1] 程改兰 贺大伟 FENG Jin-guang;CHENG Gai-lan;HE Da-wei(College of Mechanical and Electrical Engineering,Henan Polytechnic,Zhengzhou 450008,China;School of Mechanical and Electrical Engineering,Zhengzhou Vocational College of Information Technology,Zhengzhou 450008,China;Henan Mechanical Design and Research Institute Co.,Ltd.,Zhengzhou 450008,China)

机构地区：[1]河南职业技术学院机电工程学院,河南郑州450008 [2]郑州信息科技职业学院机电工程学院,河南郑州450008 [3]河南省机械设计研究院有限公司,河南郑州450008

出　　处：《材料保护》2021年第9期86-89,共4页Materials Protection

基　　金：河南省基础与前沿技术研究计划项目(152300410146)资助。

摘　　要：为获得膜基结合力更高的刀具,选择Al/Cr金属作为过渡层,分析了不同溅射电流下Al/Cr-DLC膜的组织和力学性能,膜厚都在1.50~1.70μm左右。结果显示:随着溅射电流增加,过渡层厚度变化不明显;增大溅射电流后,膜层中的Cr、Al比例也随之增加,过渡层可以促进元素更快扩散;各膜层拉曼光谱都在1000~2000 cm^(-1)区间形成了非晶碳的非对称峰。随着溅射电流的增大,Cr、Al元素在膜中的含量也明显提高。增大溅射电流后,膜层中形成了更高比例的Al和Cr,而I_(D)/I_(G)的比值先增大再减小,最大比值出现于3.0 A电流下。逐渐增大溅射电流的过程中,残余应力先减小再升高,最低残余应力出现于溅射电流为3.0 A下。当膜层中存在过渡层时,内应力发生了显著降低。当溅射电流由1.0A升高至3.0 A时,膜层的硬度和弹性模量都出现了降低。In order to obtain higher binding force of film base for cutting tools,Al/Cr metal was selected as the transition layer to analyze the microstructure and mechanical properties of Al/Cr-DLC films with 1.50~1.70μm of film thickness under different sputtering current.Results showed that the thickness of transition layer changed little with the increase of sputtering current.The increase of sputtering current could improve the proportion of Cr and Al in the film layer and promote the diffusion of elements faster.The Raman spectra of each film layer formed asymmetric peaks of amorphous carbon in the range of 1000~2000 cm^(-1).With the increase of sputtering current,the content of Cr and Al elements in the film also increased significantly.After the sputtering current was increased,a higher proportion of Al and Cr was obtained in the film layer,while the I_(D)/I_(G)ratio first increased and then decreased,the maximum ratio of which appeared at 3.0 A of current.Besides,during the process of gradually increasing sputtering current,the residual stress first decreased and then increased,and the lowest residual stress appeared at 3.0 A of sputtering current.When there was a transition layer in the film,the internal stress greatly declined.As the sputtering current increased from 1.0 A to 3.0 A,the hardness and elastic modulus of the film decreased.

关 键 词：磁控溅射 DLC膜 Al/Cr过渡层 电流 性能 

分 类 号：TG174.444[金属学及工艺—金属表面处理]