量子点光刻技术及其显示应用  

Photolithography of Colloidal Quantum Dots for Display Applications

作　　者：张萍萍 杨高岭 康果果[2] 石建兵[1] 钟海政[1] ZHANG Ping-Ping;YANG Gao-Ling;KANG Guo-Guo;SHI Jian-Bing;ZHONG Hai-Zheng(MIT Key Laboratory for Low-Dimensional Quantum Structure and Derices,School of Materials Science&Engineering,Bejing Institute of Technology,Bejing 100081,China;School of Optics and Photonics,Bejing Institute of Technology,Beijing 100081,China)

机构地区：[1]北京理工大学材料学院,工信部低维量子结构与器件重点实验室,北京100081 [2]北京理工大学光电学院,北京100081

出　　处：《应用化学》2021年第9期1175-1188,共14页Chinese Journal of Applied Chemistry

基　　金：北京理工大学青年教师学术启动计划(No.3040011182113);京东方科技集团股份有限公司资助。

摘　　要：量子点显示器件具有高光谱纯度、宽色域、高亮度等优势,被认为是显示行业未来的一个重要发展方向。发展量子点高精度光刻图案化技术对实现其在显示领域的应用具有重要的意义。本文阐述了量子点光刻技术的最新进展,主要包括光刻胶辅助剥离光刻和直接光刻技术。在直接光刻技术方面,着重介绍混入光刻胶光刻和配体工程光刻,并对图案化的量子点发光层在光致发光和电致发光中的应用进展进行评述。同时,介绍量子点光刻中存在的问题并展望其在超高分辨率显示领域的应用前景。Quantum dot(QD)light-emitting diodes(LEDs)are considered as a promising direction for next-generation display applications because of their excellent spectral purity,wide color gamut,and high brightness.However,developing a technology for high-resolution patterning of QDs remains challenging.This paper expounds the latest progress of QDs photolithography technology,including lift-off photolithography and direct photolithography technology.In the direct photolithography technology,we are focusing on the mixed photoresist and ligand engineering photolithography,we also introduce the progress of patterned QDs luminescence layer in photoluminescence and electroluminescence application.Finally,we provide the problems in QDs photolithography and our outlooks for potential future directions in the field of ultra-high resolution display.

关 键 词：光刻 量子点 图案化 显示 

分 类 号：O648[理学—物理化学]