单体大尺寸高精度全息光栅制造技术综述  

Review of monomeric large-size and high precision holographic planar grating manufacturing technology

作　　者：王磊杰[1] 张鸣[1] 朱煜[1] WANG Lei-jie;ZHANG Ming;ZHU Yu(State Key Laboratory of Tribology&Beijing Key Lab of Precision/Ultra-precision Manufacturing Equipments and Control,Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China)

机构地区：[1]清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室,北京100084

出　　处：《光学精密工程》2021年第8期1759-1768,共10页Optics and Precision Engineering

基　　金：国家重大科技专项资助项目(No.2017ZX02102004,No.2018ZX02101003)。

摘　　要：单体大尺寸高精度全息平面光栅是高端浸没式光刻机、惯性约束核聚变等高端装备和重大工程的核心器件,制造难度极高。本文综述了单体大尺寸高精度全息平面光栅的主要制造技术,介绍了基于单次大尺寸干涉光刻技术和干涉光刻步进拼接技术的单体大尺寸高精度全息平面光栅制造技术的研究进展以及存在的问题,并着重对基于扫描干涉光刻技术的单体大尺寸高精度全息光栅制造技术的研究进展进行论述。最后,总结了大尺寸高精度平面光栅制造技术——扫描干涉光刻技术的发展趋势。Monomeric large-size planar gratings with high accuracy are a key optical element in semiconductor lithography tooling,inertial confinement fusion,and other applications. However,such gratings are extremely difficult to fabricate. The technologies used for manufacturing high-accuracy monomeric large-size planar gratings are reviewed in this paper. The main manufacturing technologies are introduced,and their advantages as well as disadvantages are discussed. The research progress and the existing challenges associated with single large-aperture interference lithography and stepping interference lithography are discussed. The research progress with regard to scanning beam interference lithography(SBIL),which is the most promising manufacturing technology for monomeric large-size planar gratings,is reviewed as a highlight. Finally,the development trend of SBIL technology is summarized.

关 键 词：全息平面光栅 扫描干涉光刻 条纹锁定 栅距/方向/相位控制 

分 类 号：TH741[机械工程—光学工程]