反射镜基片无损伤清洗技术研究  

Research on No-damage Cleaning Technology of Mirror Substrate

作　　者：张晋宽[1] 白满社[1] 滕霖[1] ZHANG Jin-kuan;BAI Man-she;TENG Lin(AVIC Xi'an Flight Automatic Control Research Institute,Xi'an 710065)

机构地区：[1]航空工业西安飞行自动控制研究所,西安710065

出　　处：《航空精密制造技术》2021年第5期1-3,8,共4页Aviation Precision Manufacturing Technology

摘　　要：本文以抛光表面模型为理论,分析了基片表面损伤产生的机理,设计正交实验,得出了基片表面损伤产生的主要因素。通过改进清洗工艺,制备出了无损伤的超光滑表面。In the field of optical processing, the focus of cleaning technology research was to improve surface cleanliness. Whether the cleaning process caused damage, due to the difficulty of damage detection, most of them were theoretical analysis and less experimental research. Based on the surface model of polishing, this paper analyzed the mechanism of substrate surface damage, designed the orthogonal experiment, and obtained the main factors of substrate surface damage.By improving the cleaning process, the super-smooth surface without damage was prepared.

关 键 词：无损伤清洗 亚表面损伤 超光滑表面 反射镜 

分 类 号：TN305.2[电子电信—物理电子学]