磷化铟的动态磁场集群磁流变抛光工艺实验  

Technological Experiment of Cluster Magnetorheological Finishing of InP Wafer with Dynamic Magnetic Fields

作　　者：孙世孔 路家斌[1,2] 阎秋生 SUN Shikong;LU Jiabin;YAN Qiusheng(School of Electromechanical Engineering,Guangdong University of Technology,Guangzhou Guangdong 510006,China;Guangdong Nanogrind Technology Co.,Ltd.,Foshan Guangdong 528225,China)

机构地区：[1]广东工业大学机电工程学院,广东广州510006 [2]广东纳诺格莱科技有限公司,广东佛山528225

出　　处：《润滑与密封》2021年第11期40-45,共6页Lubrication Engineering

基　　金：NSFC-广东省联合基金项目(U1801259);国家自然科学基金项目(52075102);佛山市科技创新专项资金项目(2018IT100242).

摘　　要：为实现磷化铟高质量表面的绿色加工,使用动态磁场集群磁流变抛光对单晶磷化铟进行正交抛光实验,研究各工艺参数(抛光盘转速、工件转速、磁极转速和偏摆速度)对抛光速率及抛光表面粗糙度的影响。利用回归分析法建立反映材料去除率及表面粗糙度与抛光工艺参数关系的回归方程。结果显示:在抛光工艺参数中,工件转速对材料去除率影响最大,偏摆速度影响最小;对表面粗糙度影响最大的是抛光盘转速,磁极转速影响最小;在优化工艺参数(抛光盘转速40 r/min、工件转速500 r/min、磁极转速30 r/min、偏摆速度200 mm/min)下对单晶磷化铟抛光3 h后,表面粗糙度由R_(a)33 nm降至R_(a)0.35 nm,材料去除率为2.5μm/h,表明采用动态集群磁流变抛光的方法加工单晶磷化铟,可以得到高质量加工表面;建立的材料去除率及表面粗糙度回归模型,拟合优度判定系数分别为0.9842和0.937,表明利用回归分析法建立的磷化铟磁流变抛光的材料去除率及表面粗糙度回归模型,能够有效地预测磷化铟集群磁流变抛光效果。In order to achieve high quality surface and green finishing of InP,the orthogonal test was carried out to study the effects of the speed of finishing plate, magnetic pole, workpiece, and the oscillation on the material removal rate(MRR) and surface roughness of finishing.The regression equation model reflecting the relationship between material removal rate, surface roughness and polishing process parameters were established by regression analysis.The results show that among the polishing process parameters, the speed of workpiece is the most important factor for MRR and the oscilation rate has the least impact on MRR,the speed of plate is the most important factor for surface roughness and the speed of magnetic pole has the least impact on surface roughness.After 3 h polishing, the surface roughness of InP wafer can be reduced to 0.35 nm from 33 nm and the material removal rate can reach to 2.5 μm/h under the optimal finishing parameters(the speed of finishing plate is 40 r/min, the speed of workpiece is 500 r/min, the speed of magnetic pole is 30 r/min, and the oscillation rate is 200 mm/min),which indicates that the sub-nanometer surface roughness of InP wafer can be obtained using the cluster magnetorheological finishing with dynamic magnetic fields.The coefficient of goodness of fit between the results of the regression model of MRR and surface roughness and the experimental results are 0.984 2 and 0.937,respectively, which indicates that the regression model of MRR and surface roughness using regression analysis can effectively predict the effect of cluster magnetorheological finishing with dynamic magnetic.

关 键 词：磷化铟 磁流变抛光 工艺优化 抛光效果 回归模型 

分 类 号：TH117.1[机械工程—机械设计及理论]