基于穆勒椭偏的纳米薄膜厚度测量与溯源  

Measurement and Traceability of Nano-Film Thickness Based on Mueller Ellipsometry

作　　者：杜黎明 管钰晴 孔明 平少栋 谢张宁 雷李华 傅云霞[1,2,3] Du Liming;Guan Yuqing;Kong Ming;Ping Shaodong;Xie Zhangning;Lei Lihua;Fu Yunxia(College of Metrology and Testing Engineering,China Jiliang University,Hangzhou 310018,China;Shanghai Institute of Metrology and Testing Technology,Shanghai 201203,China;Shanghai Key Laboratory of Online Testing and Control Technology,Shanghai 201203,China)

机构地区：[1]中国计量大学计量测试工程学院,杭州310018 [2]上海市计量测试技术研究院,上海201203 [3]上海市在线检测与控制技术重点实验室,上海201203

出　　处：《微纳电子技术》2021年第12期1121-1127,共7页Micronanoelectronic Technology

基　　金：国防技术基础科研项目(JSJL2019210B004);国家市场监督管理总局科技项目(2019MK016);上海市自然科学基金探索项目(21ZR1483100)。

摘　　要：基于双旋转补偿器穆勒矩阵椭偏仪系统的薄膜厚度测量方法,通过膜厚比对分析对椭偏仪进行能力认证,实现纳米薄膜的高精度测量研究。设计了一套复合型膜厚标准样片,采用多种仪器测量其膜厚并对测量结果进行有效比对,给出相应的不确定度评定方法,研究了纳米薄膜厚度的量值溯源传递方式。首先用穆勒矩阵椭偏系统测量标定值为(100.4±0.4)nm的SiO_(2)/Si纳米薄膜标准样片,得到了膜厚测量结果为100.85 nm,相对误差仅为0.45%,说明了系统具有高精度的薄膜厚度测量能力;然后利用该系统测量标称值为50 nm的SiO_(2)/Si复合型膜厚标准样片,得到6次连续重复性测量的膜厚平均值为55.80 nm,标准偏差为0.005 nm,扩展不确定度为0.84 nm,包含因子为2,验证了复合型膜厚样片的准确性。最后,进行计量型原子力显微镜和椭偏仪膜厚测量对比实验,得到复合型膜厚样片的测量结果具有良好的一致性,开辟了一种以复合型膜厚标准样片为标准物质的纳米膜厚量值溯源传递新途径。Based on the film thickness measurement method of the dual rotating compensator Mueller matrix ellipsometer system, the ability of the ellipsometer was verified through the film thickness comparison analysis to realize the high-precision measurement research of nano-film. A set of composite film thickness standard samples were designed, multiple instruments were used to measure their film thickness, and the measurement results were effectively compared, the corresponding uncertainty evaluation method was given. The traceability transmission of the nano-film thickness was studied. First, the Mueller matrix ellipsometric system was used to measure the standard sample of SiO_(2)/Si nano-film with a calibration value of(100.4±0.4) nm. The film thickness measurement result is 100.85 nm, and the relative error is only 0.45%,which shows that the system has high-precision film thickness measurement capability. Then the system was used to measure the SiO_(2)/Si composite film thickness standard sample with a nominal value of 50 nm. The measured average film thickness of 6 consecutive repeatability measurements is 55.80 nm, the standard deviation is 0.005 nm, the extended uncertainty is 0.84 nm, and the inclusion factor is 2, verifing the accuracy of the composite film thickness sample. Finally, film thickness measurement comparison experiment between a measurement type atomic force microscope and an ellipsometer was carried out. The measurement results of the composite film thickness sample have good consistency. A new method for traceability transmission of nano-film thickness using the composite film thickness standard samples as the standard materials was proposed.

关 键 词：纳米计量 双旋转补偿器穆勒椭偏仪 复合型膜厚标准样片 纳米薄膜 量值溯源 

分 类 号：TN307[电子电信—物理电子学] TB921[一般工业技术—计量学]