透射菊池衍射技术(TKD)的进展研究  

Research on the Progress of Transmission Kikuchi Diffraction Technology(TKD)

作　　者：刘晶 索红莉[1] 纪耀堂 武鑫宇 刘敏[1] 马麟[1] 戴银明[2] 张子立 LIU Jing;SUO Hongli;JI Yaotang;WU Xinyu;LIU Min;MA Lin;DAI Yinming;ZHANG Zili(College of Materials Science and Engineering,Beijing University of Technology,Beijing 100124,China;Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]北京工业大学材料科学与工程学院,北京100124 [2]中国科学院电工研究所,北京100190

出　　处：《真空科学与技术学报》2021年第10期913-922,共10页Chinese Journal of Vacuum Science and Technology

基　　金：国家重点研发项目(2018YFF0109401);北京市自然基金(2212025);国家重大科研仪器研制项目(51827810);中国科学院磁共振技术联盟科研仪器设备研制项目(2020GZL001)。

摘　　要：电子背散射衍射(EBSD)技术在材料晶体结构及取向信息的研究方面作出很大贡献,但其空间分辨率较低,在纳米晶体表征方面遇到困难。透射菊池衍射(TKD)技术自2012年提出以来,因其较高的空间分辨率,迅速在纳米材料表征领域受到极大关注。本文通过查阅总结大量文献,回顾了TKD技术的发展历程,并对其研究进展进行了总结。其中主要包括三大部分,首先介绍了TKD的工作原理及部分重要设置参数的影响。其次介绍了TKD近几年在纳米晶粒、大变形量金属以及氧化物薄膜等领域的应用。最后对TKD表征技术在未来的发展趋势进行了展望。Electron backscatter diffraction(EBSD)technology has made great contributions to the researchof material crystal structure and orientation information,but its spatial resolution is low(which is greater than 100 nanometers),so it is difficult for researchers to characterize nanocrystals.Since the transmission Kikuchi diffrac-tion(TKD)technology was proposed in 2012,it has quickly received great attention in the field of nanomaterialcharacterization due to its high spatial resolution.This article reviewed the development of TKD technology by re-viewing a large number of literatures.The development history of TKD technology was reviewed,and the researchprogress of TKD was also summarized.It mainly includes three parts.Firstly,the working principle of TKD and theinfluence of some important setting parameters are introduced.Secondly,the application of TKD in the fields ofnanocrystalline grains,large deformation metals and oxide films in recent years is introduced.Finally,the futuredevelopment trend of TKD characterization technology is prospected.

关 键 词：透射菊池衍射 电子背散射衍射 纳米 分辨率 

分 类 号：TG115.23[金属学及工艺—物理冶金]