基底的晶向和氧化层厚度对坡莫合金薄膜的影响  

The Effect of Substrate Orientation and Oxide Layer Thickness on Permalloy Film

作　　者：冯润东 张文伟 FENG Rundong;ZHANG Wenwei(University of Chinese Academy of Sciences,Beijing 100049,China;Xi'an Institute of Optics and Precision Mechanics of CAS,Xi'an 710119,China)

机构地区：[1]中国科学院大学,北京100049 [2]中国科学院西安光学精密机械研究所,西安710119

出　　处：《真空科学与技术学报》2021年第10期941-945,共5页Chinese Journal of Vacuum Science and Technology

基　　金：瞬态光学与光子技术国家重点实验室(中国科学院西安光学精密机械研究所)开放课题基金(Y92B301)。

摘　　要：利用磁控溅射的方法,在不同规格的硅片上制备相同的NiFe薄膜,主要研究不同晶向的硅片对薄膜磁阻率的影响,以及(100)晶向硅片不同氧化层厚度对薄膜的影响。通过测试磁阻率、方阻,再综合X射线衍射分析,得到以下结论:由于(111)晶向基底与NiFe主峰的晶向相同,对NiFe薄膜有诱导作用,因此溅射薄膜的晶粒大,内部缺陷少,内部质点排列规则,且NiFe(111)含量高,减弱了载流子与声子、载流子与缺陷的散射作用,降低了方阻,从而增大了磁阻率;在退火处理后,磁阻率出现明显增幅,且仍高于(100)晶向基片上NiFe薄膜的磁阻率。在(100)晶向基底上制备的NiFe薄膜,氧化层厚度对其薄膜质量影响不大。The magnetron sputtering method was used to prepare NiFe thin films on silicon wafers of different specifications.The influence of different substrate orientations and oxide layer thickness on the thin films was studied.By testing the magnetic reluctivity and sheet resistance,and crystal structural analysis using X-ray diffraction,the following conclusions are obtained.The substrate orientation(111)is the same as that of the main peak of NiFe.This affects the structure of NiFe films.The sputtered film has a large grain size,fewer internal defects,and regular particle arrangement.It has a high content of NiFe(111),which weakens the scattering between carriers and phonons,carrier and defects,and reduces the sheet resistance,thereby increasing the magnetic reluctivity.After annealing,the magnetic reluctivity shows a significant increase,which is still higher than the magnetic reluctivity of NiFe film on substrate(100).The oxide layer thickness has little influence on the quality of NiFe thin films sputtered on the silicon wafers(100).

关 键 词：各向异性磁电阻 NiFe薄膜 基底 磁控溅射 X射线衍射 

分 类 号：TN384[电子电信—物理电子学]