原子层沉积LiPON薄膜的表面钝化研究  

Surface Passivation for LiPON Film by Atomic Layer Deposition

作　　者：王一同 冯泽 井美艺 孙勇 罗锋 黄晓东[3] 董红[1] WANG Yi-tong;FENG Ze;JING Mei-yi;SUN Yong;LUO Feng;HUANG Xiao-dong;DONG Hong(School of Electronic Information and Optical Engineering,Nankai University,Tianjin 300350,China;School of Materials Science and Engineering,Nankai University,Tianjin 300350,China;School of Electronic Science and Engineering,Southeast University,Nanjing 210096,China)

机构地区：[1]南开大学电子信息与光学工程学院,天津300350 [2]南开大学材料科学与工程学院,天津300350 [3]东南大学电子科学与工程学院,江苏南京210096

出　　处：《真空电子技术》2021年第6期67-73,共7页Vacuum Electronics

基　　金：国家重点研发项目(2018YFB2200500,2018YFB2200504);国家自然科学基金项目(22090010,22090911,61504070)。

摘　　要：LiPON是一种重要的固态电解质,然而LiPON薄膜会与空气中的水和CO_(2)发生反应产生Li_(2)CO_(3),导致器件的电学性能变差。本工作利用X射线光电子能谱研究了通过原子层沉积(ALD)技术生长Al_(2)CO_(3)薄膜来钝化LiPON薄膜,并且对比了多种方案:在ALD生长Al_(2)CO_(3)薄膜之前对样品表面不做预处理,利用O_(3)作为生长Al_(2)CO_(3)薄膜的前驱体,以及N_(2)和O_(2)的等离子体预处理后再在LiPON薄膜表面生长Al_(2)CO_(3)薄膜。结果显示只有通过原位O_(2)等离子体预处理,可以实现Al_(2)CO_(3)薄膜在LiPON薄膜表面的生长,并且抑制住了暴露空气后LiPON表面Li_(2)CO_(3)的形成,起到了钝化效果。本研究通过原位钝化,提高了LiPON薄膜在空气中的稳定性,为其在微型全固态锂电池工业应用奠定基础。Though LiPON is an important solid-state electrolyte,the LiPON film is apt to react with H_(2)O and CO_(2) in air forming Li_(2)CO_(3),which degrades the electrical performance of devices.Passivation for LiPON by Al_(2)CO_(3) film atomic layer deposition(ALD)is studied with X-ray photoelectron spectroscopy(XPS).Several ALD processes of Al_(2)CO_(3) thin film have been attempted on LiPON surface including without any pretreatment,with O_(2) or N_(2) plasma pretreatment and with O_(3) as precursor.The result shows that Al_(2)CO_(3) can only be grown on LiPON surface pretreated by O_(2) plasma,and the Al_(2)CO_(3) passivation layer can inhibit Li_(2)CO_(3) forming on LiPON surface when exposed in air.In situ passivation improves the stability of LiPON in air,which lays a foundation for miniaturized all-solid-state Li-ion battery application in industry.

关 键 词：LIPON 原子层沉积 Al_(2)O_(3) 钝化 X射线光电子能谱 

分 类 号：TG174[金属学及工艺—金属表面处理]