Determination of a Safe Distance for Atomic Hydrogen Depositions in Hot-Wire Chemical Vapour Deposition by Means of CFD Heat Transfer Simulations  

作　　者：Lionel Fabian Fourie Lynndle Square 

机构地区：[1]Department of Physics and Astronomy,University of the Western Cape,Bellville,7535,South Africa [2]Department of Physics,North-West University,Potchefstroom,2520,South Africa

出　　处：《Fluid Dynamics & Materials Processing》2020年第2期225-235,共11页流体力学与材料加工（英文）

摘　　要：A heat transfer study was conducted,in the framework of Computational Fluid Dynamics(CFD),on a Hot-Wire Chemical Vapour Deposition(HWCVD)reactor chamber to determine a safe deposition distance for atomic hydrogen produced by HWCVD.The objective of this study was to show the feasibility of using heat transfer simulations in determining a safe deposition distance for deposition of this kind.All CFD simulations were set-up and solved within the framework of the CFD packages of OpenFOAM namely;snappyHexMesh for mesh generation,buoyantSimpleFoam and rhoSimpleFoam as the solvers and paraView as the post-processing tool.Using a standard set of deposition parameters for the production of atomic hydrogen by HWCVD,plots of the gas temperature in the deposition region were produced.From these plots,we were able to determine a safe deposition distance in the HWCVD reactor to be in the range between 3 and 4 cm from the filament.

关 键 词：Heat transfer HWCVD OPENFOAM atomic hydrogen 

分 类 号：TG1[金属学及工艺—金属学]