High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens  

作　　者：Yueqiang Hu Ling Li Rong Wang Jian Song Hongdong Wang Huigao Duan Jiaxin Ji Yonggang Meng 

机构地区：[1]State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body,College of Mechanical and Vehicle Engineering,Hunan University,Changsha 410082,China [2]State Key Laboratory of Tribology,Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China [3]College of Mechanical and Electronic Engineering,China University of Petroleum,Qingdao 266580,China

出　　处：《Engineering》2021年第11期1623-1630,共8页工程（英文）

基　　金：We acknowledge the financial support by the National Natural Science Foundation of China(91623105 and 52005175);Natural Science Foundation of Hunan Province of China(2020JJ5059).

摘　　要：Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping.Lithography in the near field using the surface plasmon polariton(i.e.,plasmonic lithography)provides a promising solution.The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive highthroughput methods.However,a smaller and steadier plasmonic nanogap,new scheme of plasmonic lens,and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication.Herein,a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s^(-1).A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses.Parallel lithography of the nanostructures with the smallest(around 26 nm)linewidth is obtained with the prototyping system.The proposed system holds great potential for high-freedom nanofabrication with low cost,such as planar optical elements and nano-electromechanical systems.

关 键 词：Nanofabrication Surface plasmon polariton LITHOGRAPHY Plasmonic flying head Plasmonic lens 

分 类 号：TB383.1[一般工业技术—材料科学与工程]