Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography  

作　　者：Di Wang Xiaofeng Yi Lei Zhang 

机构地区：[1]State Key Laboratory of Structural Chemistry,Fujian Institute of Research on the Structure of Matter,Chinese Academy of Sciences,Fuzhou 350002,China [2]University of Chinese Academy of Sciences,Beijing 100049,China

出　　处：《Science China Chemistry》2022年第1期114-119,共6页中国科学（化学英文版）

基　　金：supported by the National Natural Science Foundation of China(21922111,91961108)。

摘　　要：Nanolithography plays crucial roles in the miniaturization of dense integrated circuit,which extremely depends on innovative resist materials.Recently,metal-containing resists have been explored due to their higher short-wavelength photon absorption than traditional polymer resists.Herein,for the first time,the patterning performance of non-alkyl tin-oxo clusters has been evaluated.Meanwhile,the influence of structural characteristics on resolution and sensitivity has been investigated.To evaluate the surface ligand effect,three non-alkyl Sn_(10)-oxo clusters with the same core were functionalized with pyrazole,3-methylpyrazole and 4-methylpyrazole,respectively.Furthermore,another Sn_(14)-oxo cluster with similar core configuration was also prepared using 4-methylpyrazole ligand to study the influence of Sn nuclearity.Spin-coating method was then applied to fabricate thin films of these non-alkyl tin-oxo clusters on Si substrate,which showed various thicknesses and roughnesses.More interestingly,electron beam lithography(EBL)patterning studies indicated that for the same Sn_(10)core,the 4-methylpyrazoledecorated clusters showed the best performance.As for the different cluster cores with the same 4-methylpyrazole ligand,the patterns of Sn_(10)with the higher ligand:Sn ratio are also better than those of Sn_(14).Finally,distinguishable 50 nm resolution was achieved by 4-methylpyrazole-decorated Sn_(10)at expose energy of 100μC/cm2which can be significantly improved by increasing expose energy to 1,000μC/cm2as confirmed by atomic force microscopy(AFM)images.This work not only opens the nanolithography applications of non-alkyl tin-oxo clusters,but also provides an effective structural methodology for improving their patterning performance in future.

关 键 词：non-alkyl tin-oxo clusters NANOLITHOGRAPHY ligands effect EBL patterning materials 

分 类 号：TB383.1[一般工业技术—材料科学与工程]